Silicon fin line edge roughness determination and sensitivity analysis by Mueller matrix spectroscopic ellipsometry based scatterometry

2015 ◽  
Author(s):  
Dhairya Dixit ◽  
Samuel O'Mullane ◽  
Sravan Sunkoju ◽  
Erik R. Hosler ◽  
Vimal Kamineni ◽  
...  
Keyword(s):  
Sensitivity Analysis ◽  
Spectroscopic Ellipsometry ◽  
Mueller Matrix ◽  
Line Edge Roughness ◽  
Fin Line ◽  
Edge Roughness

Application of Mueller matrix spectroscopic ellipsometry to determine line edge roughness on photomasks

2013 ◽  
Author(s):  
A. Heinrich ◽  
I. Dirnstorfer ◽  
J. Bischoff ◽  
U. Richter ◽  
H. Ketelson ◽  
...  
Keyword(s):  
Spectroscopic Ellipsometry ◽  
Mueller Matrix ◽  
Line Edge Roughness ◽  
Edge Roughness

Nondestructive analysis of lithographic patterns with natural line edge roughness from Mueller matrix ellipsometric data

2016 ◽  
Vol 388 ◽  
pp. 524-530 ◽  
Author(s):  
Xiuguo Chen ◽  
Yating Shi ◽  
Hao Jiang ◽  
Chuanwei Zhang ◽  
Shiyuan Liu
Keyword(s):  
Mueller Matrix ◽  
Line Edge Roughness ◽  
Nondestructive Analysis ◽  
Edge Roughness

Impact of Fin Line Edge Roughness and Metal Gate Granularity on Variability of 10-nm Node SOI n-FinFET

2019 ◽  
Vol 66 (11) ◽  
pp. 4646-4652 ◽  
Author(s):  
Akhil Sudarsanan ◽  
Sankatali Venkateswarlu ◽  
Kaushik Nayak
Keyword(s):  
Line Edge Roughness ◽  
Metal Gate ◽  
Fin Line ◽  
Edge Roughness

Characterization of Line-Edge Roughness in Cu/Low-kInterconnect Pattern

2008 ◽  
Vol 47 (4) ◽  
pp. 2501-2505 ◽  
Author(s):  
Atsuko Yamaguchi ◽  
Daisuke Ryuzaki ◽  
Ken-ichi Takeda ◽  
Jiro Yamamoto ◽  
Hiroki Kawada ◽  
...  
Keyword(s):  
Line Edge Roughness ◽  
Edge Roughness
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