Sensitivity analysis of line-edge roughness measured by means of scatterometry: a simulation-based investigation

Mapping Intimacies ◽

10.1117/12.916348 ◽

2012 ◽

Author(s):

Bartosz Bilski ◽

Karsten Frenner ◽

Wolfgang Osten

Keyword(s):

Sensitivity Analysis ◽

Line Edge Roughness ◽

Edge Roughness ◽

Simulation Based

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Sensitivity analysis and line edge roughness determination of 28-nm pitch silicon fins using Mueller matrix spectroscopic ellipsometry-based optical critical dimension metrology

Journal of Micro/Nanolithography MEMS and MOEMS ◽

10.1117/1.jmm.14.3.031208 ◽

2015 ◽

Vol 14 (3) ◽

pp. 031208 ◽

Author(s):

Dhairya Dixit ◽

Samuel O’Mullane ◽

Sravan Sunkoju ◽

Abhishek Gottipati ◽

Erik R. Hosler ◽

...

Keyword(s):

Sensitivity Analysis ◽

Spectroscopic Ellipsometry ◽

Critical Dimension ◽

Mueller Matrix ◽

Line Edge Roughness ◽

Edge Roughness ◽

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Silicon fin line edge roughness determination and sensitivity analysis by Mueller matrix spectroscopic ellipsometry based scatterometry

10.1117/12.2185543 ◽

2015 ◽

Author(s):

Dhairya Dixit ◽

Samuel O'Mullane ◽

Sravan Sunkoju ◽

Erik R. Hosler ◽

Vimal Kamineni ◽

...

Keyword(s):

Sensitivity Analysis ◽

Spectroscopic Ellipsometry ◽

Mueller Matrix ◽

Line Edge Roughness ◽

Fin Line ◽

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Sensitivity Analysis for Cash Flow Simulation Based Real Option Valuation

SSRN Electronic Journal ◽

10.2139/ssrn.1864909 ◽

2011 ◽

Author(s):

Tero J. Haahtela

Keyword(s):

Sensitivity Analysis ◽

Cash Flow ◽

Real Option ◽

Flow Simulation ◽

Option Valuation ◽

Real Option Valuation ◽

Simulation Based

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Characterization of Line-Edge Roughness in Cu/Low-kInterconnect Pattern

Japanese Journal of Applied Physics ◽

10.1143/jjap.47.2501 ◽

2008 ◽

Vol 47 (4) ◽

pp. 2501-2505 ◽

Author(s):

Atsuko Yamaguchi ◽

Daisuke Ryuzaki ◽

Ken-ichi Takeda ◽

Jiro Yamamoto ◽

Hiroki Kawada ◽

...

Keyword(s):

Line Edge Roughness ◽

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Study of the acid-diffusion effect on line edge roughness using the edge roughness evaluation method

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.1490392 ◽

2002 ◽

Vol 20 (4) ◽

pp. 1342 ◽

Author(s):

Masaki Yoshizawa ◽

Shigeru Moriya

Keyword(s):

Evaluation Method ◽

Line Edge Roughness ◽

Diffusion Effect ◽

Acid Diffusion ◽

Edge Roughness ◽

On Line ◽

Roughness Evaluation

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Interactions Between Line Edge Roughness and Random Dopant Fluctuation in Nonplanar Field-Effect Transistor Variability

IEEE Transactions on Electron Devices ◽

10.1109/ted.2013.2276072 ◽

2013 ◽

Vol 60 (10) ◽

pp. 3277-3284 ◽

Author(s):

Greg Leung ◽

Chi On Chui

Keyword(s):

Field Effect ◽

Field Effect Transistor ◽

Line Edge Roughness ◽

Random Dopant Fluctuation ◽

Edge Roughness ◽

Effect Transistor ◽

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Application of cellular neural networks in the measurement of line-width and line edge roughness

10.1117/12.676727 ◽

2006 ◽

Author(s):

Hong-bo Li ◽

Xue-zheng Zhao ◽

Wei Chu ◽

Ning Li

Keyword(s):

Neural Networks ◽

Cellular Neural Networks ◽

Line Edge Roughness ◽

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Fabrication of low line edge roughness mold by SOG replica method

Digest of Papers. 2004 International Microprocesses and Nanotechnology Conference, 2004. ◽

10.1109/imnc.2004.245725 ◽

2004 ◽

Author(s):

Y. Kurashima ◽

H. Hiroshima ◽

M. Komuro ◽

N. Yamazaki ◽

J. Taniguchi ◽

...

Keyword(s):

Replica Method ◽

Line Edge Roughness ◽

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A new physical model and experimental measurements of copper interconnect resistivity considering size effects and line-edge roughness (LER)

2009 IEEE International Interconnect Technology Conference ◽

10.1109/iitc.2009.5090396 ◽

2009 ◽

Author(s):

Gerald Lopez ◽

Jeffrey Davis ◽

James Meindl

Keyword(s):

Physical Model ◽

Size Effects ◽

Experimental Measurements ◽

Line Edge Roughness ◽

Copper Interconnect ◽

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Sensitivitätsanalyse des Fördergutverhaltens*/Sensitivity analysis of transported material – Physics simulation based analysis of bulk material related to the topology of vibratory bowl feeders

wt Werkstattstechnik online ◽

10.37544/1436-4980-2015-09-64 ◽

2015 ◽

Vol 105 (09) ◽

pp. 622-626

Author(s):

C. Stocker ◽

G. Reinhart

Keyword(s):

Sensitivity Analysis ◽

Future Development ◽

Development Process ◽

Bulk Material ◽

Automated Generation ◽

Simulation Based ◽

Physics Simulation ◽

Material Physics ◽

Transported Material

Vibrationswendelförderer (VWF) sind die meistverwendeten Systeme zur automatisierten Vereinzelung und Zuführung von Schüttgut. Zur Verbesserung der derzeit manuellen Entwicklung, werden Methoden zur Simulation von VWF erforscht. Der Fachartikel stellt eine physiksimulationsbasierte Sensitivitätsanalyse des Förderguts bezüglich der Topologie im VWF vor. Die Ergebnisse dieser Analyse dienen als Basis für die Entwicklung eines Verfahrens zur automatischen Generierung von Ordnungsschikanen.   Vibratory bowl feeders (VBF) are the most frequently used systems for automated sorting and feeding of bulk material. To improve the current manual development process, methods for simulation of VBF are researched. The presented paper introduces a physics simulation based sensitivity analysis of the behavior of transported parts related to the topology of the VBF. These results provide a basis for the future development of an algorithm for the automated generation of orienting devices.

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