Impact of Fin Line Edge Roughness and Metal Gate Granularity on Variability of 10-nm Node SOI n-FinFET

2019 ◽  
Vol 66 (11) ◽  
pp. 4646-4652 ◽  
Author(s):  
Akhil Sudarsanan ◽  
Sankatali Venkateswarlu ◽  
Kaushik Nayak
Keyword(s):  
Line Edge Roughness ◽  
Metal Gate ◽  
Fin Line ◽  
Edge Roughness

Line-edge roughness reduction for advanced metal gate etch with 193-nm lithography in a silicon decoupled plasma source etcher (DPSII)

2003 ◽  
Author(s):  
Tito Chowdhury ◽  
Hanna Bamnolker ◽  
Roni Khen ◽  
Chan-Lon Yang ◽  
Hean-Cheal Lee ◽  
...  
Keyword(s):  
Plasma Source ◽  
Line Edge Roughness ◽  
Metal Gate ◽  
Edge Roughness ◽  
193 Nm

Degeneration of Line-Edge Roughness-Induced Variability for Dual-Metal Gate Fin Field-Effect Transistors

2020 ◽  
Vol 15 (1) ◽  
pp. 142-146
Author(s):  
Liang Dai ◽  
Wei-Feng Lü
Keyword(s):  
Computer Aided Design ◽  
Field Effect ◽  
Field Effect Transistors ◽  
Line Edge Roughness ◽  
Metal Gate ◽  
Edge Roughness ◽  
Simulation Results ◽  
Dual Metal ◽  
Aided Design ◽  
First Time

We investigate, for the first time, the effect of line-edge roughness (LER)-induced variability for dual-metal gate (DMG) Fin field-effect transistors (FinFETs) using a computer-aided-design simulation. The Gaussian autocorrelation function is utilized for generating the LER sequence. From the standard deviations of subthreshold swing (SS), threshold voltage (VTH), and transconductance (gm), the simulation results indicate that the LER-induced electrostatic integrity variability is related to the ratio of control gate to total gate lengths. The variability caused by LER degrades with respect to the length of control gate near the source. Our work fills a gap in the study of LER-induced variability for DMG FinFETs, and suggests that the length of the control gate near the source should be greater than or equal to the screen gate near the drain in the entire gate.

Characterization of Line-Edge Roughness in Cu/Low-kInterconnect Pattern

2008 ◽  
Vol 47 (4) ◽  
pp. 2501-2505 ◽  
Author(s):  
Atsuko Yamaguchi ◽  
Daisuke Ryuzaki ◽  
Ken-ichi Takeda ◽  
Jiro Yamamoto ◽  
Hiroki Kawada ◽  
...  
Keyword(s):  
Line Edge Roughness ◽  
Edge Roughness
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