Laser-induced damage threshold detection for optical thin films and research on damage morphology

With the development of high power laser systems, laser protection of optical components becomes more and more important. In order to enhance the laser-induced damage capability of optical films components, besides advanced methods and processes, post-treatment has significant influence on the laser-induced damage threshold (LIDT) of thin films. Q switch Nd:YAG laser of the working wave length at 1064nm, was used to post process on ZnSe single layer films with thickness of /2 (=1064nm) deposited by thermal evaporation, and the laser-induced damage and optical properties were investigated. By changing the energy density and pulse number under the spot size remained a fixed value, their effects on thin films damage threshold were studied respectively, the optimal processing parameters were obtained: energy density is 3.0 J/cm2 and pulse number is 1.The LIDT of post processed ZnSe films was improved from 5.0J/cm2 to 8.2J/cm2.

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Laser induced damage threshold studies of HfO2-SiO2 composite thin films

10.1063/1.4732373 ◽

2012 ◽

Cited By ~ 2

Author(s):

R. B. Tokas ◽

N. M. Kamble ◽

S. Jena ◽

S. Thakur ◽

A. K. Poswal ◽

...

Keyword(s):

Thin Films ◽

Damage Threshold ◽

Composite Thin Films ◽

Laser Induced Damage

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Influence of oxygen partial pressure on microstructure, optical properties, residual stress and laser induced damage threshold of amorphous HfO2 thin films

Journal of Alloys and Compounds ◽

10.1016/j.jallcom.2018.08.327 ◽

2019 ◽

Vol 771 ◽

pp. 373-381 ◽

Cited By ~ 13

Author(s):

S. Jena ◽

R.B. Tokas ◽

S. Tripathi ◽

K.D. Rao ◽

D.V. Udupa ◽

...

Keyword(s):

Thin Films ◽

Residual Stress ◽

Optical Properties ◽

Oxygen Partial Pressure ◽

Partial Pressure ◽

Damage Threshold ◽

Laser Induced Damage

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Influence of Annealing Temperature on Structure, Optical Loss and Laser-Induced Damage Threshold of TiO 2 Thin Films

Chinese Physics Letters ◽

10.1088/0256-307x/24/10/070 ◽

2007 ◽

Vol 24 (10) ◽

pp. 2967-2969 ◽

Cited By ~ 2

Author(s):

Tian Guang-Lei ◽

Wu Shi-Gang ◽

Yang Lu-Yun ◽

Shu Kang-Ying ◽

Qin Lai-Shun ◽

...

Keyword(s):

Thin Films ◽

Annealing Temperature ◽

Optical Loss ◽

Damage Threshold ◽

Laser Induced Damage

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Anisotropic Laser-Induced Damage Threshold and Residual Stress of TiO2 Sculptured Thin Films

Journal of Nanoscience and Nanotechnology ◽

10.1166/jnn.2013.5961 ◽

2013 ◽

Vol 13 (2) ◽

pp. 824-828 ◽

Cited By ~ 1

Author(s):

Xiudi Xiao ◽

Lei Miao ◽

Ming Zhang ◽

Gang Xu ◽

Jianda Shao ◽

...

Keyword(s):

Thin Films ◽

Residual Stress ◽

Damage Threshold ◽

Sculptured Thin Films ◽

Laser Induced Damage

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Properties of Hafnium and Aluminium Silicates Coatings Obtained by PLD

Coatings ◽

10.3390/coatings11070753 ◽

2021 ◽

Vol 11 (7) ◽

pp. 753

Author(s):

Eduard N. Sirjita ◽

Laurentiu Rusen ◽

Simona Brajnicov ◽

Cristina Craciun ◽

Valentin Ion ◽

...

Keyword(s):

Thin Films ◽

Photoelectron Spectroscopy ◽

Damage Threshold ◽

Processing Technique ◽

Laser Wavelength ◽

Hafnium Silicate ◽

Vis Spectroscopy ◽

Laser Induced Damage ◽

Silicate Layers ◽

Aluminium Silicate

We report on the deposition and characterization of hafnium silicate and aluminium silicate thin films for different applications in optics and electronics. Pulsed laser deposition in a controllable oxygen atmosphere was used as a processing technique, with optimized parameters in terms of laser wavelength, laser fluence and oxygen pressure. The thin films were investigated using atomic force microscopy, spectroscopic ellipsometry, UV–VIS spectroscopy and X-ray photoelectron spectroscopy. The morphological investigations evidenced uniform layers with low roughness (in the order of nanometres). The optical investigations revealed that aluminium silicate layers with low roughness and low absorption in the infrared (IR) range can be obtained at high substrate temperatures (600 °C). The behaviour of the silicate thin films with respect to the nanosecond IR laser irradiation revealed that aluminium silicate layers have higher laser-induced damage threshold values in comparison with hafnium silicate.

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