Study of the micro/nano-texture design to improve the friction properties of DLC thin films
In this study, a DLC pattern was fabricated through a photolithography process that constitutes a part of the semiconductor process, to investigate the frictional wear characteristics. The photolithography was used to produce negative patterns with a pattern width of 10 [Formula: see text]m or 20 [Formula: see text]m and a pattern depth of 500 nm on the DLC surface. The change in the coefficient of friction of the surface was investigated through a ball-on-disk tribology test on the fabricated micro/nano-sized DLC pattern. The DLC pattern fabricated by the photolithography process showed a superior coefficient of friction to that of the general DLC sample. These results show that the decrease in the surface friction coefficient of the patterned DLC thin film is due to the reduction in the surface contact area owing to the modification of the micro/nano-texture of the surface as well as the low friction characteristics of the DLC.