PREPARATION OF ADHERENT MnSix FILMS
2002 ◽
Vol 16
(07)
◽
pp. 205-215
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Keyword(s):
The adhesion of manganese silicide ( MnSi x) films on silicon and glass substrates is studied by using the micro-scratch method. The films were prepared by electron beam evaporation and thermal evaporation. To improve adhesion of the films, several techniques including ion bombardment, increasing substrate temperature, and insertion of a silicon intermediate layer were used. Finally, adherent MnSi x(x~1.7) films were prepared through solid phase reaction as well as reactive deposition. The hardness and modulus of the MnSi x(x~1.7) film were measured by a nano-indenter and the values are 8.8±1.0 GPa and 141±15 GPa, respectively.
2007 ◽
Vol 204
(10)
◽
pp. 3429-3437
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2019 ◽
Vol 7
(5)
◽
pp. 2283-2290
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Keyword(s):
1997 ◽
Vol 113-114
◽
pp. 53-56
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2010 ◽
Vol 663-665
◽
pp. 743-750
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1983 ◽
Vol 243
(1)
◽
pp. 123-129
◽
2016 ◽
Vol 697
◽
pp. 510-514
◽
2000 ◽
Vol 147
(1)
◽
pp. 373
◽