Magnetic Relaxation and Flux Creep in Superconducting YBCO Thin Films

2003 ◽  
Vol 17 (20n21) ◽  
pp. 1075-1080 ◽  
Author(s):  
Ali Ihsan Demirel
Keyword(s):  
Thin Films ◽  
Magnetic Relaxation ◽  
Effective Activation Energy ◽  
Chemical Deposition ◽  
Activation Energies ◽  
Organic Chemical ◽  
Relaxation Data ◽  
Broad Agreement ◽  
Ybco Thin Films ◽  
Metal Organic

In this work, the temperature dependence of the magnetic relaxation in samples of YBa 2 Cu 3 O 7 (YBCO) thin films of two different qualities grown on MgO by metal organic chemical deposition technique (MOCVD) is measured in the range of 4.2–80 K using an initial applied magnetic field of 0.1 T. The relaxation data are analyzed in terms of a single effective activation energy and then more correctly of a distribution of activation energies. The single activation energies extracted are in broad agreement with published results.

Anisotropy of the critical current in YBCO thin films grown by metal organic chemical vapour deposition

1997 ◽  
Vol 251 (1-2) ◽  
pp. 351-354 ◽  
Author(s):  
C. Dubourdieu ◽  
O. Lebedev ◽  
G. Delabouglise ◽  
F. Weiss ◽  
U. Schmatz ◽  
...  
Keyword(s):  
Thin Films ◽  
Critical Current ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Organic Chemical ◽  
Ybco Thin Films ◽  
Metal Organic

scholarly journals A quick and versatile one step metal–organic chemical deposition method for supported Pt and Pt-alloy catalysts

RSC Advances ◽  
2020 ◽  
Vol 10 (34) ◽  
pp. 19982-19996 ◽  
Author(s):  
Colleen Jackson ◽  
Graham T. Smith ◽  
Nobuhle Mpofu ◽  
Jack M. S. Dawson ◽  
Thulile Khoza ◽  
...  
Keyword(s):  
Carbon Nanofiber ◽  
Chemical Deposition ◽  
Organic Chemical ◽  
Nanoparticle Deposition ◽  
Support Materials ◽  
Pt Alloy ◽  
Metal Organic ◽  
One Step ◽  
Chemical Deposition Method ◽  
Alloy Catalysts

A simple, modified Metal–Organic Chemical Deposition (MOCD) method for Pt, PtRu and PtCo nanoparticle deposition onto a variety of support materials, including C, SiC, B4C, LaB6, TiB2, TiN and a ceramic/carbon nanofiber, is described.

Properties of Tin Oxide Films Prepared by MOCVD

2004 ◽  
Vol 449-452 ◽  
pp. 997-1000 ◽  
Author(s):  
Gwang Pyo Choi ◽  
Yong Joo Park ◽  
Whyo Sup Noh ◽  
Jin Seong Park
Keyword(s):  
Thin Films ◽  
Oxygen Content ◽  
Tin Oxide ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Organic Chemical ◽  
Metal Organic ◽  
Organic Chemical Vapor Deposition ◽  
Tin Oxide Films ◽  
N2 Annealing

Tin oxide thin films were deposited at 375 °C on α-alumina substrate by metal-organic chemical vapor deposition (MOCVD) process. A number of hillocks on the film were formed after air annealing at 500 °C for 30 min and few things in N2 annealing. The oxygen content and the binding energy after air annealing came to close the stoichiometric SnO2. The cauliflower hillocks of the film seem to be formed by the continuous migration of crystallites from a cauliflower grain on the substrate to release the stress due to the increase of oxygen content and volume.

Transparent conducting indium oxide thin films grown by low-temperature metal organic chemical vapor deposition

2007 ◽  
Vol 515 (5) ◽  
pp. 2921-2925 ◽  
Author(s):  
Chunyu Wang ◽  
Volker Cimalla ◽  
Genady Cherkashinin ◽  
Henry Romanus ◽  
Majdeddin Ali ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Low Temperature ◽  
Indium Oxide ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Organic Chemical ◽  
Transparent Conducting ◽  
Metal Organic ◽  
Organic Chemical Vapor Deposition

Study on ZrO2:Er Thin Films Fabricated by Metal-Organic Chemical Vapor Deposition

2003 ◽  
Vol 42 (Part 1, No. 5A) ◽  
pp. 2839-2842 ◽  
Author(s):  
Jeong Hoon Park ◽  
Kug Sun Hong ◽  
Woon Jo Cho ◽  
Jang-Hoon Chung
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Organic Chemical ◽  
Metal Organic ◽  
Organic Chemical Vapor Deposition
Sign in / Sign up

Export Citation Format

Share Document