OPTIMIZED SPUTTERING POWER TO INCORPORATE WO3 INTO C–TiO2 NANOTUBES FOR HIGHLY VISIBLE PHOTORESPONSE PERFORMANCE

NANO ◽  
2012 ◽  
Vol 07 (06) ◽  
pp. 1250051 ◽  
Author(s):  
CHIN WEI LAI ◽  
SRIMALA SREEKANTAN
Keyword(s):  
Crystal Structure ◽  
Optical Properties ◽  
Electron Transport ◽  
Radio Frequency ◽  
Tio2 Nanotubes ◽  
Radio Frequency Sputtering ◽  
Photocurrent Generation ◽  
Sputtering Power

WO3 -incorporated C–TiO2 nanotubes were successfully fabricated using radio frequency sputtering technique. The effects of sputtering powers on the nanotube morphology, crystal structure, optical properties and visible photoresponse were investigated. Lattice substitution of WO3 species within the lattice of C–TiO2 nanotubes has an important function in maximizing the photocurrent generation. WO3 -incorporated C–TiO2 nanotubes exhibit good visible photoresponse compared with C–TiO2 nanotubes. The interpretation of interband states has an important function in improving photoinduced electron transport.

Tuning silicon nitride refractive index through radio-frequency sputtering power

2021 ◽  
pp. 138951
Author(s):  
Daniela De Luca ◽  
Emiliano Di Gennaro ◽  
Davide De Maio ◽  
Carmine D’Alessandro ◽  
Antonio Caldarelli ◽  
...  
Keyword(s):  
Refractive Index ◽  
Silicon Nitride ◽  
Radio Frequency ◽  
Radio Frequency Sputtering ◽  
Sputtering Power

Effect of Sputtering Power on the Structure and Optical Properties of Radio Frequency Sputtered-ZnS Thin Film

2017 ◽  
Vol 17 (7) ◽  
pp. 5046-5049 ◽  
Author(s):  
Dong Ryeol Kim ◽  
Donghyun Hwang ◽  
Chang-Sik Son ◽  
Young Guk Son
Keyword(s):  
Thin Film ◽  
Optical Properties ◽  
Radio Frequency ◽  
Sputtering Power

Optical properties of Mn-Co-Ni-O thin films prepared by radio frequency sputtering deposition

2014 ◽  
Vol 115 (9) ◽  
pp. 093512 ◽  
Author(s):  
Wei Zhou ◽  
Jing Wu ◽  
Cheng Ouyang ◽  
Yanqing Gao ◽  
Xiaofeng Xu ◽  
...  
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Radio Frequency ◽  
Sputtering Deposition ◽  
Radio Frequency Sputtering

Role of Sputtering Power on the Structural and Optical Properties of ZnO/SiO2 Films Deposited by Radio Frequency Magnetron Sputtering

2013 ◽  
Vol 760-762 ◽  
pp. 776-779
Author(s):  
Shuang Li ◽  
Ming Chen ◽  
Feng Xiang Wang
Keyword(s):  
Optical Properties ◽  
Magnetron Sputtering ◽  
Radio Frequency ◽  
Rf Magnetron Sputtering ◽  
Zno Films ◽  
X Ray Diffraction ◽  
Structural And Optical Properties ◽  
Force Microscopy ◽  
Sputtering Power

In the present work, we investigated the effect of sputtering power on the structural and optical properties of ZnO films by radio frequency (rf) magnetron sputtering. Atom force microscopy (AFM), X-ray diffraction (XRD) and Prism coupling method were adopted to investigate the structure and optical properties of ZnO thin films deposited by sputtering powers in the range from 100~150W. XRD and AFM results shown that ZnO films with high c-axis preferred orientation crystalline structures have been successfully deposited under higher sputtering power condition. Moreover, it was also found that the indexes refractive of the films obtained by higher sputtering power are less than that of the bulk ZnO materials, which is closer to Crystal Refractive index.

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