Investigation of Substrate-dependent Characteristics of SnO2Thin Films with Hall Effect, X-Ray Diffraction, X-Ray Photoelectron Spectroscopy and Atomic Force Microscopy Measurements

1999 ◽  
Vol 38 (Part 1, No. 4A) ◽  
pp. 2103-2107 ◽  
Author(s):  
Byeongdeok Yea ◽  
Hajime Sasaki ◽  
Tomoyuki Osaki ◽  
Kazunori Sugahara ◽  
Ryosuke Konishi
Keyword(s):  
Atomic Force Microscopy ◽  
Hall Effect ◽  
Photoelectron Spectroscopy ◽  
X Ray Diffraction ◽  
X Ray ◽  
Force Microscopy ◽  
Atomic Force

Characterization of X-ray irradiated graphene oxide coatings using X-ray diffraction, X-ray photoelectron spectroscopy, and atomic force microscopy

2013 ◽  
Vol 28 (2) ◽  
pp. 68-71 ◽  
Author(s):  
Thomas N. Blanton ◽  
Debasis Majumdar
Keyword(s):  
Atomic Force Microscopy ◽  
Graphene Oxide ◽  
Photoelectron Spectroscopy ◽  
High Energy ◽  
X Ray Diffraction ◽  
Carbon Phase ◽  
X Ray ◽  
Force Microscopy ◽  
Atomic Force ◽  
Before And After

In an effort to study an alternative approach to make graphene from graphene oxide (GO), exposure of GO to high-energy X-ray radiation has been performed. X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), and atomic force microscopy (AFM) have been used to characterize GO before and after irradiation. Results indicate that GO exposed to high-energy radiation is converted to an amorphous carbon phase that is conductive.

Study on the Energy Structure of Amorphous Antireflection Er2O3 Films on Si(001) Substrates

2010 ◽  
Vol 663-665 ◽  
pp. 612-615
Author(s):  
Yan Yan Zhu ◽  
Ze Bo Fang ◽  
Ting Ji ◽  
Yong Sheng Liu
Keyword(s):  
Atomic Force Microscopy ◽  
Electronic Structure ◽  
Photoelectron Spectroscopy ◽  
Energy Gap ◽  
Antireflection Coating ◽  
Energy Structure ◽  
X Ray Diffraction ◽  
X Ray ◽  
Force Microscopy ◽  
Atomic Force

Er2O3 films were deposited on Si(001) substrates by radio frequency magnetron technique. X-ray photoelectron spectroscopy, x-ray diffraction and atomic force microscopy show the Er2O3 films obtained are stoichiometric, amorphous, and uniform. The electronic structure is studied which shows a large energy gap value of the Er2O3 film, indicating Er2O3 film could be a promising antireflection coating for solar cells.

Atomic force microscopy, X-ray diffraction, X-ray photoelectron spectroscopy and thermal studies of the new melamine fiber

2002 ◽  
Vol 16 (14) ◽  
pp. 1957-1978 ◽  
Author(s):  
R. S. Rajeev ◽  
S. K. De ◽  
Anil K. Bhowmick ◽  
Bill Gong ◽  
S. Bandyopadhyay
Keyword(s):  
Atomic Force Microscopy ◽  
Photoelectron Spectroscopy ◽  
Thermal Studies ◽  
X Ray Diffraction ◽  
X Ray ◽  
Force Microscopy ◽  
Atomic Force

Investigation of the Effect of Uv-Assisted Oxidation and Nitridation of Hafnium Metal Films

2003 ◽  
Vol 780 ◽  
Author(s):  
C. Essary ◽  
V. Craciun ◽  
J. M. Howard ◽  
R. K. Singh
Keyword(s):  
Uv Radiation ◽  
Photoelectron Spectroscopy ◽  
Grazing Angle ◽  
X Ray Diffraction ◽  
Metal Thin Films ◽  
X Ray ◽  
Force Microscopy ◽  
Si Substrates ◽  
Atomic Force ◽  
Silicon Interface

AbstractHf metal thin films were deposited on Si substrates using a pulsed laser deposition technique in vacuum and in ammonia ambients. The films were then oxidized at 400 °C in 300 Torr of O2. Half the samples were oxidized in the presence of ultraviolet (UV) radiation from a Hg lamp array. X-ray photoelectron spectroscopy, atomic force microscopy, and grazing angle X-ray diffraction were used to compare the crystallinity, roughness, and composition of the films. It has been found that UV radiation causes roughening of the films and also promotes crystallization at lower temperatures.Furthermore, increased silicon oxidation at the interface was noted with the UVirradiated samples and was shown to be in the form of a mixed layer using angle-resolved X-ray photoelectron spectroscopy. Incorporation of nitrogen into the film reduces the oxidation of the silicon interface.

Nanocrystalline Solutions as Precursors to The Spray Deposition of Cdte Thin Films

1995 ◽  
Vol 382 ◽  
Author(s):  
Martin Pehnt ◽  
Douglas L. Schulz ◽  
Calvin J. Curtis ◽  
Helio R. Moutinho ◽  
Amy Swartzlander ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Force Microscopy ◽  
Grain Size ◽  
X Ray Diffraction ◽  
X Ray ◽  
Force Microscopy ◽  
Cdte Nanoparticles ◽  
Atomic Force ◽  
Vis Spectroscopy ◽  
Cdte Thin Films

ABSTRACTIn this article we report the first nanoparticle-derived route to smooth, dense, phase-pure CdTe thin films. Capped CdTe nanoparticles were prepared by injection of a mixture of Cd(CH3)2, (n-C8H17)3 PTe and (n-C8H17)3P into (n-C8H17)3PO at elevated temperatures. The resultant nanoparticles 32-45 Å in diameter were characterized by x-ray diffraction, UV-Vis spectroscopy, transmission electron microscopy, thermogravimetric analysis and energy dispersive x-ray spectroscopy. CdTe thin film deposition was accomplished by dissolving CdTe nanoparticles in butanol and then spraying the solution onto SnO2-coated glass substrates at variable susceptor temperatures. Smooth and dense CdTe thin films were obtained using growth temperatures approximately 200 °C less than conventional spray pyrolysis approaches. CdTe films were characterized by x-ray diffraction, UV-Vis spectroscopy, atomic force microscopy, and Auger electron spectroscopy. An increase in crystallinity and average grain size as determined by x-ray diffraction was noted as growth temperature was increased from 240 to 300 °C. This temperature dependence of film grain size was further confirmed by atomic force microscopy with no remnant nanocrystalline morphological features detected. UV-Vis characterization of the CdTe thin films revealed a gradual decrease of the band gap (i.e., elimination of nanocrystalline CdTe phase) as the growth temperature was increased with bulk CdTe optical properties observed for films grown at 300 °C.

Structural and morphological characterisation of ruthenium phthalocyanine films by energy dispersive X-ray diffraction and atomic force microscopy

2001 ◽  
Vol 382 (1-2) ◽  
pp. 74-80 ◽  
Author(s):  
R. Caminiti ◽  
A. Capobianchi ◽  
P. Marovino ◽  
A.M. Paoletti ◽  
G. Padeletti ◽  
...  
Keyword(s):  
Atomic Force Microscopy ◽  
Energy Dispersive ◽  
X Ray Diffraction ◽  
Morphological Characterisation ◽  
X Ray ◽  
Force Microscopy ◽  
Atomic Force

Investigation of Ti/CuO interface by X-ray photoelectron spectroscopy and atomic force microscopy

2018 ◽  
Vol 51 (2) ◽  
pp. 246-253
Author(s):  
Dev Raj Chopra ◽  
Justin Seth Pearson ◽  
Darius Durant ◽  
Ritesh Bhakta ◽  
Anil R. Chourasia
Keyword(s):  
Atomic Force Microscopy ◽  
Photoelectron Spectroscopy ◽  
X Ray ◽  
Force Microscopy ◽  
Atomic Force
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