X-Ray Photoelectron Spectroscopy and Temperature-Programmed Desorption Studies of Nitrided Molybdena-Alumina Catalyst

2000 ◽  
Vol 39 (Part 1, No. 7B) ◽  
pp. 4473-4476 ◽  
Author(s):  
Kenichiro Hada ◽  
Masatoshi Nagai ◽  
Shinzo Omi
2005 ◽  
Vol 879 ◽  
Author(s):  
Scott K. Stanley ◽  
John G. Ekerdt

AbstractGe is deposited on HfO2 surfaces by chemical vapor deposition (CVD) with GeH4. 0.7-1.0 ML GeHx (x = 0-3) is deposited by thermally cracking GeH4 on a hot tungsten filament. Ge oxidation and bonding are studied at 300-1000 K with X-ray photoelectron spectroscopy (XPS). Ge, GeH, GeO, and GeO2 desorption are measured with temperature programmed desorption (TPD) at 400-1000 K. Ge initially reacts with the dielectric forming an oxide layer followed by Ge deposition and formation of nanocrystals in CVD at 870 K. 0.7-1.0 ML GeHx deposited by cracking rapidly forms a contacting oxide layer on HfO2 that is stable from 300-800 K. Ge is fully removed from the HfO2 surface after annealing to 1000 K. These results help explain the stability of Ge nanocrystals in contact with HfO2.


2016 ◽  
Vol 879 ◽  
pp. 2032-2037 ◽  
Author(s):  
Gabriele Lapi ◽  
Carlo Alvani ◽  
Francesca Varsano ◽  
Saulius Kaciulis ◽  
Roberto Montanari ◽  
...  

The present work investigates the effect of heat treatments in air on the surface and structure of titanium hydride (TiH2) and hydrogen desorption. TiH2 has been heated in air at 440 and 540 °C for increasing time up to 180 min. to obtain the samples representative of 12 different oxidation conditions. The samples have been then examined by Temperature Programmed Desorption (TPD), X-Ray Diffraction (XRD) and Photoelectron Spectroscopy (XPS). Experimental results are presented and discussed.


Langmuir ◽  
1999 ◽  
Vol 15 (11) ◽  
pp. 3993-3997 ◽  
Author(s):  
G. S. Herman ◽  
Y. J. Kim ◽  
S. A. Chambers ◽  
C. H. F. Peden

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