Improved Etched Surface Morphology in Electron Cyclotron Resonance-Reactive Ion Etching of GaN by Cyclic Injection of CH4/H2/Ar and O2with Constant Ar Flow

Reactive Ion Etching ◽

Electron Cyclotron ◽

Ion Etching ◽

Etched Surface ◽

Electron Cyclotron Resonance-Reactive Ion Etching of III-V Semiconductors by Cyclic Injection of CH4/H2/Ar and O2with Constant Ar Flow

Japanese Journal of Applied Physics ◽

10.1143/jjap.42.3958 ◽

2003 ◽

Vol 42 (Part 1, No. 6B) ◽

pp. 3958-3961 ◽

Cited By ~ 5

Author(s):

Nobuo Haneji ◽

Goh Segami ◽

Tomoyoshi Ide ◽

Tatsuya Suzuki ◽

Taro Arakawa ◽

...

Keyword(s):

Cyclotron Resonance ◽

Reactive Ion Etching ◽

Electron Cyclotron ◽

Ion Etching ◽

Digest of Papers Microprocesses and Nanotechnology 2003. 2003 International Microprocesses and Nanotechnology Conference ◽

Electron cyclotron resonance-reactive ion etching of InGaAs/InAlAs/InP multilayer structure and GaN by cyclic injection of CH/sub 4//H/sub 2//Ar and O/sub 2/ with constant Ar flow

10.1109/imnc.2003.1268780 ◽

2004 ◽

Author(s):

N. Haneji ◽

T. Ide ◽

Y. Awa ◽

T. Arakawa ◽

K. Tada ◽

...

Keyword(s):

Cyclotron Resonance ◽

Multilayer Structure ◽

Reactive Ion Etching ◽

Electron Cyclotron ◽

Ion Etching ◽

2002 International Microprocesses and Nanotechnology Conference, 2002. Digest of Papers. ◽

Electron cyclotron resonance-reactive ion etching of III-V semiconductors by cyclic injection of CH/sub 4//H/sub 2//Ar and O/sub 2/

10.1109/imnc.2002.1178548 ◽

2003 ◽

Author(s):

N. Haneji ◽

G. Segami ◽

T. Suzuki ◽

T. Arakawa ◽

K. Tada ◽

...

Keyword(s):

Cyclotron Resonance ◽

Reactive Ion Etching ◽

Electron Cyclotron ◽

Ion Etching ◽

Electron cyclotron resonance reactive ion etching of fine features in HgxCd1−xTe using CH4/H2 plasmas

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.578421 ◽

1993 ◽

Vol 11 (4) ◽

pp. 1763-1767 ◽

Cited By ~ 37

Author(s):

C. R. Eddy ◽

E. A. Dobisz ◽

J. R. Meyer ◽

C. A. Hoffman

Keyword(s):

Cyclotron Resonance ◽

Reactive Ion Etching ◽

Electron Cyclotron ◽

Ion Etching

Effect ofN2Addition on Aluminum Alloy Etching by Electron Cyclotron Resonance Reactive Ion Etching and Magnetically Enhanced Reactive Ion Etching

Japanese Journal of Applied Physics ◽

10.1143/jjap.34.2147 ◽

1995 ◽

Vol 34 (Part 1, No. 4B) ◽

pp. 2147-2151 ◽

Cited By ~ 8

Author(s):

Yoshihiro Kusumi ◽

Nobuo Fujiwara ◽

Junko Matsumoto ◽

Masahiro Yoneda

Keyword(s):

Aluminum Alloy ◽

Cyclotron Resonance ◽

Reactive Ion Etching ◽

Electron Cyclotron ◽

Ion Etching

Digest of Papers. 2004 International Microprocesses and Nanotechnology Conference, 2004. ◽

Electron cyclotron resonance-reactive CH/sub 4//H/sub 2//Ar with constant Ar flow for high etch rate and improvement of etched surface morphology

10.1109/imnc.2004.245651 ◽

2004 ◽

Author(s):

Y. Awa ◽

T. Ide ◽

T. Arakawa ◽

N. Haneji ◽

K. Tada ◽

...

Keyword(s):

Surface Morphology ◽

Cyclotron Resonance ◽

Etch Rate ◽

Electron Cyclotron ◽

High Etch Rate ◽

Etched Surface

Optical properties of modulation‐doped quantum wires fabricated by electron cyclotron resonance reactive ion etching

Applied Physics Letters ◽

10.1063/1.110352 ◽

1993 ◽

Vol 63 (2) ◽

pp. 237-239 ◽

Cited By ~ 10

Author(s):

J. S. Weiner ◽

J. M. Calleja ◽

A. Pinczuk ◽

A. Schmeller ◽

B. S. Dennis ◽

...

Keyword(s):

Optical Properties ◽

Cyclotron Resonance ◽

Quantum Wires ◽

Reactive Ion Etching ◽

Electron Cyclotron ◽

Ion Etching

Fluorocarbon high density plasma. VI. Reactive ion etching lag model for contact hole silicon dioxide etching in an electron cyclotron resonance plasma

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.578850 ◽

1994 ◽

Vol 12 (3) ◽

pp. 665-670 ◽

Cited By ~ 43

Author(s):

O. Joubert ◽

G. S. Oehrlein ◽

M. Surendra

Keyword(s):

Silicon Dioxide ◽

Cyclotron Resonance ◽

Reactive Ion Etching ◽

Electron Cyclotron ◽

High Density ◽

Ion Etching ◽

Lag Model ◽

Resonance Plasma ◽

Density Plasma

Effects of bias frequency on reactive ion etching lag in an electron cyclotron resonance plasma etching system

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.580702 ◽

1997 ◽

Vol 15 (3) ◽

pp. 664-667 ◽

Cited By ~ 13

Author(s):

Hyun-Ho Doh ◽

Chung-Kyu Yeon ◽

Ki-Woong Whang

Keyword(s):

Plasma Etching ◽

Cyclotron Resonance ◽

Reactive Ion Etching ◽

Electron Cyclotron ◽

Ion Etching ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma ◽

Etching System

Reactive ion etching lag investigation of oxide etching in fluorocarbon electron cyclotron resonance plasmas

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.578989 ◽

1994 ◽

Vol 12 (4) ◽

pp. 1957-1961 ◽

Cited By ~ 15

Author(s):

O. Joubert ◽

G. S. Oehrlein ◽

M. Surendra ◽

Y. Zhang

Keyword(s):

Cyclotron Resonance ◽

Reactive Ion Etching ◽

Electron Cyclotron ◽

Ion Etching ◽

Oxide Etching