Suppression of Fluorine Penetration by Use of In Situ Stacked Chemical Vapor Deposited Tungsten Film

1999 ◽  
Vol 146 (8) ◽  
pp. 3092-3096 ◽  
Author(s):  
Kow‐Ming Chang ◽  
I‐Chung Deng ◽  
Hong‐Yi Lin
Keyword(s):  
Chemical Vapor ◽  
Tungsten Film ◽  
Chemical Vapor Deposited

Effect of Temperature on the Microstructure of Boron Nitride Formed In Situ on Chemical Vapor-Deposited Boron in Ammonia Gas

2011 ◽  
Vol 94 (3) ◽  
pp. 679-682 ◽  
Author(s):  
Siwei Li ◽  
Litong Zhang ◽  
Fang Ye ◽  
Yongsheng Liu ◽  
Laifei Cheng ◽  
...  
Keyword(s):  
Boron Nitride ◽  
Chemical Vapor ◽  
Effect Of Temperature ◽  
Ammonia Gas ◽  
Chemical Vapor Deposited

The growth and in situ characterization of chemical vapor deposited SiO2

1987 ◽  
Vol 83 (2) ◽  
pp. 290-296 ◽  
Author(s):  
R. Iyer ◽  
R.R. Chang ◽  
D.L. Lile
Keyword(s):  
Chemical Vapor ◽  
In Situ Characterization ◽  
Chemical Vapor Deposited

Barrier Characteristics of Chemical Vapor Deposited Amorphous‐like Tungsten Silicide with In Situ Nitrogen Plasma Treatment

1999 ◽  
Vol 146 (7) ◽  
pp. 2533-2539
Author(s):  
Kow‐Ming Chang ◽  
I‐Chung Deng ◽  
Ta‐Hsun Yeh ◽  
Chien‐Wen Shih
Keyword(s):  
Plasma Treatment ◽  
Chemical Vapor ◽  
Nitrogen Plasma ◽  
Tungsten Silicide ◽  
Chemical Vapor Deposited

Suppression of Fluorine Impurity in Blanket Chemical Vapor Deposited Tungsten Film for Via Fills with A Novel Two-step Deposition Technique

1997 ◽  
Vol 36 (Part 1, No. 4A) ◽  
pp. 2061-2067 ◽  
Author(s):  
Kow-Ming Chang ◽  
Ta-Hsun Yeh ◽  
Kuen-Der Lain ◽  
Chao-Ming Fu
Keyword(s):  
Chemical Vapor ◽  
Deposition Technique ◽  
Tungsten Film ◽  
Chemical Vapor Deposited
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