Growth Rate and Characterization of Silicon Oxide Films Grown in  N 2 O  Atmosphere in a Rapid Thermal Processor

1994 ◽  
Vol 141 (1) ◽  
pp. 259-263 ◽  
Author(s):  
P. Lange ◽  
H. Bernt ◽  
E. Hartmannsgruber ◽  
F. Naumann
Keyword(s):  
Growth Rate ◽  
Silicon Oxide ◽  
Oxide Films

Plasma-assisted chemical vapor deposition and characterization of high quality silicon oxide films

1990 ◽  
Vol 193-194 ◽  
pp. 595-609 ◽  
Author(s):  
S.V Nguyen ◽  
D Dobuzinsky ◽  
D Dopp ◽  
R Gleason ◽  
M Gibson ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Silicon Oxide ◽  
Oxide Films ◽  
Chemical Vapor ◽  
High Quality

Plasma-assisted deposition of thin silicon oxide films in a remote PECVD reactor and characterization of films produced under different conditions

Vacuum ◽  
2004 ◽  
Vol 75 (4) ◽  
pp. 307-312 ◽  
Author(s):  
F Hamelmann ◽  
A Aschentrup ◽  
A Brechling ◽  
U Heinzmann ◽  
A Gushterov ◽  
...  
Keyword(s):  
Silicon Oxide ◽  
Oxide Films ◽  
Thin Silicon

Growth and characterization of silicon oxide films formed in the presence of Si, SiC, and Si3N4

2016 ◽  
Vol 54 ◽  
pp. 20-28 ◽  
Author(s):  
Yaqiong Li ◽  
Lucas Nana Wiredu Damoah ◽  
Lifeng Zhang
Keyword(s):  
Silicon Oxide ◽  
Oxide Films

MBE growth and characterization of buried silicon oxide films on Si(100)

1996 ◽  
Vol 280 (1-2) ◽  
pp. 107-111 ◽  
Author(s):  
M. Hacke ◽  
H.L. Bay ◽  
S. Mantl
Keyword(s):  
Silicon Oxide ◽  
Oxide Films ◽  
Mbe Growth

Growth and characterization of ultrathin nitrided silicon oxide films

1999 ◽  
Vol 43 (3) ◽  
pp. 265-286 ◽  
Author(s):  
E. P. Gusev ◽  
H.-C. Lu ◽  
E. L. Garfunkel ◽  
T. Gustafsson ◽  
M. L. Green
Keyword(s):  
Silicon Oxide ◽  
Oxide Films

Effects of moisture on Fowler–Nordheim characterization of thin silicon-oxide films

1999 ◽  
Vol 17 (5) ◽  
pp. 2753-2758 ◽  
Author(s):  
Charles A. Peterson ◽  
Richard K. Workman ◽  
Dror Sarid ◽  
Bert Vermeire ◽  
Harold G. Parks ◽  
...  
Keyword(s):  
Silicon Oxide ◽  
Oxide Films ◽  
Thin Silicon

X-ray photoelectron spectroscopic characterization of ultra-thin silicon oxide films on a Mo(100) surface

1992 ◽  
Vol 279 (1-2) ◽  
pp. 119-126 ◽  
Author(s):  
J-W. He ◽  
X. Xu ◽  
J.S. Corneille ◽  
D.W. Goodman
Keyword(s):  
Silicon Oxide ◽  
Oxide Films ◽  
Spectroscopic Characterization ◽  
X Ray ◽  
Thin Silicon
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