A Theoretical Study of the Low‐Temperature Chemical Vapor Deposition of SiO2 Films
1983 ◽
Vol 130
(9)
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pp. 1888-1893
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2001 ◽
Vol 19
(2)
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pp. 507-514
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Keyword(s):
High Temperature Material Processes An International Quarterly of High-Technology Plasma Processes
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2006 ◽
Vol 10
(3)
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pp. 457-466
Keyword(s):