Control of Edge Shape, Sidewall Profile, and Sidewall Roughness of the Plasma Etched Copper

2019 ◽  
Vol 1 (11) ◽  
pp. 169-176
Author(s):  
Yue Kuo ◽  
Guojun Liu
Keyword(s):  
Sidewall Roughness

Computer simulation study about the dependence of amorphous silicon photonic waveguides efficiency on the material quality

2020 ◽  
Vol 90 (3) ◽  
pp. 30502
Author(s):  
Alessandro Fantoni ◽  
João Costa ◽  
Paulo Lourenço ◽  
Manuela Vieira
Keyword(s):  
Amorphous Silicon ◽  
High Throughput Screening ◽  
Simulation Analysis ◽  
Low Cost ◽  
Deposition Process ◽  
Large Area ◽  
Sidewall Roughness ◽  
Sensing Applications ◽  
Fabrication Defects ◽  
The Impact

Amorphous silicon PECVD photonic integrated devices are promising candidates for low cost sensing applications. This manuscript reports a simulation analysis about the impact on the overall efficiency caused by the lithography imperfections in the deposition process. The tolerance to the fabrication defects of a photonic sensor based on surface plasmonic resonance is analysed. The simulations are performed with FDTD and BPM algorithms. The device is a plasmonic interferometer composed by an a-Si:H waveguide covered by a thin gold layer. The sensing analysis is performed by equally splitting the input light into two arms, allowing the sensor to be calibrated by its reference arm. Two different 1 × 2 power splitter configurations are presented: a directional coupler and a multimode interference splitter. The waveguide sidewall roughness is considered as the major negative effect caused by deposition imperfections. The simulation results show that plasmonic effects can be excited in the interferometric waveguide structure, allowing a sensing device with enough sensitivity to support the functioning of a bio sensor for high throughput screening. In addition, the good tolerance to the waveguide wall roughness, points out the PECVD deposition technique as reliable method for the overall sensor system to be produced in a low-cost system. The large area deposition of photonics structures, allowed by the PECVD method, can be explored to design a multiplexed system for analysis of multiple biomarkers to further increase the tolerance to fabrication defects.

Manufacture of High Aspect Ratio Bulk Titanium Micro-Parts by Inductively Coupled Plasma Etching

2008 ◽  
Author(s):  
Gang Zhao ◽  
Qiong Shu ◽  
Yue Li ◽  
Jing Chen
Keyword(s):  
Aspect Ratio ◽  
High Aspect Ratio ◽  
Inductively Coupled Plasma ◽  
Etching Rate ◽  
Sidewall Roughness ◽  
Inductively Coupled ◽  
Icp Etching ◽  
Novel Technology ◽  
Micro Parts ◽  
Etching Mask

A novel technology is developed to fabricate high aspect ratio bulk titanium micro-parts by inductively coupled plasma (ICP) etching. An optimized etching rate of 0.9 μm/min has been achieved with an aspect ratio higher than 10:1. For the first time, SU-8 is used as titanium etching mask instead of the traditional hard mask such as TiO2 or SiO2. With an effective selectivity of 3 and a spun-on thickness beyond 100 μm, vertical etching sidewall and low sidewall roughness are obtained. Ultra-deep titanium etching up to 200 μm has been realized, which is among the best of the present reports. Titanium micro-springs and planks are successfully fabricated with this approach.

Small angle x-ray scattering measurements of lithographic patterns with sidewall roughness from vertical standing waves

2007 ◽  
Vol 90 (19) ◽  
pp. 193122 ◽  
Author(s):  
Chengqing Wang ◽  
Ronald L. Jones ◽  
Eric K. Lin ◽  
Wen-Li Wu ◽  
Jim Leu
Keyword(s):  
Small Angle ◽  
Standing Waves ◽  
Sidewall Roughness ◽  
X Ray ◽  
X Ray Scattering ◽  
Scattering Measurements ◽  
Ray Scattering

A Simple Method for Measuring Si-Fin Sidewall Roughness by AFM

2009 ◽  
Vol 8 (5) ◽  
pp. 611-616 ◽  
Author(s):  
Xiaohui Tang ◽  
V. Bayot ◽  
N. Reckinger ◽  
D. Flandre ◽  
J.-P. Raskin ◽  
...  
Keyword(s):  
Sidewall Roughness ◽  
Simple Method

Effect of process parameters on sidewall roughness in polymeric optical waveguides

2004 ◽  
Vol 462-463 ◽  
pp. 471-476 ◽  
Author(s):  
S.K. Pani ◽  
C.C. Wong ◽  
K. Sudharsanam ◽  
S.G. Mhaisalkar ◽  
V. Lim ◽  
...  
Keyword(s):  
Process Parameters ◽  
Optical Waveguides ◽  
Sidewall Roughness

Sidewall roughness in nanolithography: origins, metrology and device effects

2014 ◽  
pp. 503-537 ◽  
Author(s):  
V. Constantoudis ◽  
E. Gogolides ◽  
G.P. Patsis
Keyword(s):  
Sidewall Roughness

Estimation of Scattering Loss Due to Sidewall Roughness in High Power Laser Diodes

2019 ◽  
pp. 963-966
Author(s):  
Deepti Jain ◽  
Somna Mahajan ◽  
Alok Jain ◽  
Manjeet Singh ◽  
Shabbir Mohammed
Keyword(s):  
High Power ◽  
Laser Diodes ◽  
High Power Laser ◽  
Power Laser ◽  
Sidewall Roughness ◽  
Scattering Loss
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