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Oxygen Transfer from Metal Gate to High-k Gate Dielectric Stack: Interface Structure & Property Changes
ECS Transactions
◽
10.1149/1.2779562
◽
2019
◽
Vol 11
(4)
◽
pp. 213-218
◽
Cited By ~ 1
Author(s):
Jeong-Hee Ha
◽
Husam AlShareef
◽
Jim Chambers
◽
Yun Sun
◽
Piero Pianetta
◽
...
Keyword(s):
Oxygen Transfer
◽
Gate Dielectric
◽
Interface Structure
◽
Structure Property
◽
Metal Gate
◽
High K
◽
Property Changes
◽
High K Gate Dielectric
Download Full-text
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Cited By
References
Oxygen Transfer from Metal Gate to High-k Gate Dielectric Stack: Interface Structure & Property Changes
ECS Meeting Abstracts
◽
10.1149/ma2007-02/20/1132
◽
2007
◽
Keyword(s):
Oxygen Transfer
◽
Gate Dielectric
◽
Interface Structure
◽
Structure Property
◽
Metal Gate
◽
High K
◽
Property Changes
◽
High K Gate Dielectric
Download Full-text
CMOS Devices - Metal Gate & High-K Gate Dielectric
2007 IEEE International Electron Devices Meeting
◽
10.1109/iedm.2007.4418859
◽
2007
◽
Author(s):
Jong Shik Yoon
◽
Aaron Thean
Keyword(s):
Gate Dielectric
◽
Metal Gate
◽
High K
◽
High K Gate Dielectric
Download Full-text
Improvement of metal gate/high-k dielectric CMOSFETs characteristics by atomic layer etching of high-k gate dielectric
Solid-State Electronics
◽
10.1016/j.sse.2012.11.008
◽
2013
◽
Vol 82
◽
pp. 82-85
◽
Cited By ~ 4
Author(s):
K.S. Min
◽
C. Park
◽
C.Y. Kang
◽
C.S. Park
◽
B.J. Park
◽
...
Keyword(s):
Gate Dielectric
◽
Atomic Layer
◽
Metal Gate
◽
High K
◽
High K Dielectric
◽
Atomic Layer Etching
◽
High K Gate Dielectric
Download Full-text
Gate Dielectric Integrity along the Road Map of CMOS Scaling including Multi-Gate Fet, TiN Metal Gate, and HfSiON High-k Gate Dielectric
2006 IEEE International Reliability Physics Symposium Proceedings
◽
10.1109/relphy.2006.251309
◽
2006
◽
Author(s):
T. Pompl
◽
H. Mogul
◽
M. Kerber
◽
G. Haase
◽
E. Ogawa
◽
...
Keyword(s):
Gate Dielectric
◽
Metal Gate
◽
The Road
◽
Cmos Scaling
◽
Road Map
◽
High K
◽
Tin Metal
◽
High K Gate Dielectric
Download Full-text
Voltage stress induced interface states and hole trapping in germanium pMOSFETs with high-k gate dielectric and metal-gate electrode
Materials Science in Semiconductor Processing
◽
10.1016/j.mssp.2020.105612
◽
2021
◽
Vol 124
◽
pp. 105612
Author(s):
Fu-Chien Chiu
◽
Wei-Chia Chen
◽
Jih-Huah Wu
◽
Kuei-Shu Chang-Liao
Keyword(s):
Gate Dielectric
◽
Interface States
◽
Gate Electrode
◽
Metal Gate
◽
Hole Trapping
◽
High K
◽
Voltage Stress
◽
High K Gate Dielectric
Download Full-text
Analysis of GOI-MOSFET with high-k gate dielectric and metal gate fabricated by Ge condensation technique
Surface and Interface Analysis
◽
10.1002/sia.2434
◽
2006
◽
Vol 38
(12-13)
◽
pp. 1720-1724
◽
Cited By ~ 1
Author(s):
Mungi Park
◽
Jicheol Bea
◽
Takafumi Fukushima
◽
Mitsumasa Koyanagi
Keyword(s):
Gate Dielectric
◽
Metal Gate
◽
High K
◽
High K Gate Dielectric
Download Full-text
Threshold Voltage (Vth) Tunability of pMOSFETs with Ternary HfxMoyNz Metal Gate and Gd2O3 High-k Gate Dielectric
10.7567/ssdm.2009.p-1-8
◽
2009
◽
Author(s):
H. K. Peng
◽
C. S. Lai
◽
J. C. Wang
Keyword(s):
Threshold Voltage
◽
Gate Dielectric
◽
Metal Gate
◽
High K
◽
High K Gate Dielectric
Download Full-text
Thickness and material dependence of capping layers on flatband voltage (VFB) and equivalent oxide thickness (EOT) with high-k gate dielectric/metal gate stack for gate-first process applications
Microelectronic Engineering
◽
10.1016/j.mee.2011.01.034
◽
2012
◽
Vol 89
◽
pp. 34-36
◽
Cited By ~ 4
Author(s):
Changhwan Choi
Keyword(s):
Gate Dielectric
◽
Oxide Thickness
◽
Equivalent Oxide Thickness
◽
Metal Gate
◽
Gate Stack
◽
High K
◽
Flatband Voltage
◽
High K Gate Dielectric
Download Full-text
Integration of HfxTayN Metal Gate Electrode with High-k Gate Dielectric in MOS Devices
ECS Transactions
◽
10.1149/1.2193872
◽
2019
◽
Vol 2
(1)
◽
pp. 41-48
Author(s):
Rosa María Luna-Sánchez
◽
Ignacio González-Martínez
Keyword(s):
Gate Dielectric
◽
Gate Electrode
◽
Metal Gate
◽
Mos Devices
◽
High K
◽
High K Gate Dielectric
Download Full-text
A 2-D Analytical Modeling of Dual Work Function Metal Gate MOSFET Using High-K Gate Dielectric with Enhanced RF/Analog Performance for Low Power Applications
Silicon
◽
10.1007/s12633-019-00290-7
◽
2019
◽
Vol 12
(9)
◽
pp. 2065-2072
◽
Cited By ~ 1
Author(s):
R. Kiran Kumar
◽
S. Shiyamala
Keyword(s):
Low Power
◽
Work Function
◽
Analytical Modeling
◽
Gate Dielectric
◽
Metal Gate
◽
High K
◽
Analog Performance
◽
High K Gate Dielectric
Download Full-text
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