Integration of HfxTayN Metal Gate Electrode with High-k Gate Dielectric in MOS Devices

2019 ◽  
Vol 2 (1) ◽  
pp. 41-48
Author(s):  
Rosa María Luna-Sánchez ◽  
Ignacio González-Martínez
2004 ◽  
Vol 48 (10-11) ◽  
pp. 1987-1992 ◽  
Author(s):  
Shiyang Zhu ◽  
H.Y. Yu ◽  
J.D. Chen ◽  
S.J. Whang ◽  
J.H. Chen ◽  
...  

2007 ◽  
Vol 47 (6) ◽  
pp. 937-943 ◽  
Author(s):  
W.B. Chen ◽  
J.P. Xu ◽  
P.T. Lai ◽  
Y.P. Li ◽  
S.G. Xu

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