Effect of Remote-Surface-Roughness Scattering on Electron Mobility in MOSFETs with High-k Dielectrics

2019 ◽  
Vol 33 (3) ◽  
pp. 249-255 ◽  
Author(s):  
Mamat Mamatrishat ◽  
Miyuki Kouda ◽  
Takamasa Kawanago ◽  
K. Kakushima ◽  
P. Ahmet ◽  
...  
2019 ◽  
Vol 954 ◽  
pp. 51-59
Author(s):  
Xi Duo Hu ◽  
Cheng Ming Li ◽  
Shao Yan Yang

Abstract:Electron mobility limited by surface roughness scattering in free-standing GaAs thin ribbon with an internal parabolic quantum well caused by surface state is investigated in detail. Based on analyzing the parabolic quantum well including the energy subband level, wave function and the confined potential profile in the thin ribbon by solving Schrödinger and Poisson equations self-consistently, the electron mobility could be investigated. Conclusion indicates that remote surface roughness (RSR) of the thin ribbon will change the two dimensional electron gas (2DEG) mobility through the medium of barrier height fluctuation of the parabolic well in atomic scale. Calculation results reveal that the 2DEG mobility decreases with increasing roughness amplitude, which is characterized in terms of the surface roughness height and the roughness lateral size.


2020 ◽  
Vol 59 (3) ◽  
pp. 034002 ◽  
Author(s):  
Jiahui Duan ◽  
Jinjuan Xiang ◽  
Lixing Zhou ◽  
Xiaolei Wang ◽  
Xueli Ma ◽  
...  

2012 ◽  
Vol 717-720 ◽  
pp. 1101-1104 ◽  
Author(s):  
M.G. Jaikumar ◽  
Shreepad Karmalkar

4H-Silicon Carbide VDMOSFET is simulated using the Sentaurus TCAD package of Synopsys. The simulator is calibrated against measured data for a wide range of bias conditions and temperature. Material parameters of 4H-SiC are taken from literature and used in the available silicon models of the simulator. The empirical parameters are adjusted to get a good fit between the simulated curves and measured data. The simulation incorporates the bias and temperature dependence of important physical mechanisms like interface trap density, coulombic interface trap scattering, surface roughness scattering and velocity saturation.


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