Reliability Properties and Current Conduction Mechanisms of HfO2 MIS Capacitor with Dual Plasma Treatment
2020 ◽
Vol 142
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pp. 109462
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Keyword(s):
2013 ◽
Vol 10
(11)
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pp. 1417-1420
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2018 ◽
Vol 85
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pp. 98-105
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2018 ◽
Vol 100
◽
pp. 1-6
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2005 ◽
Vol 44
(1A)
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pp. 102-107
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Keyword(s):
Keyword(s):
2014 ◽
Vol 54
(6-7)
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pp. 1133-1136
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