(Invited) Voltage Ramp Stress Based Stress-And-Sense Test Method For Reliability Characterization of Hf-Base High-k/Metal Gate Stacks For CMOS Technologies

2019 ◽  
Vol 41 (3) ◽  
pp. 337-348 ◽  
Author(s):  
Eduard Cartier ◽  
Adreas Kerber ◽  
Siddarth Krishnan ◽  
Barry Linder ◽  
Takashi Ando ◽  
...  
Keyword(s):  
Test Method ◽  
Gate Stacks ◽  
Metal Gate ◽  
High K ◽  
Voltage Ramp

A novel approach to characterization of progressive breakdown in high-k/metal gate stacks

2008 ◽  
Vol 48 (11-12) ◽  
pp. 1759-1764 ◽  
Author(s):  
R. Pagano ◽  
S. Lombardo ◽  
F. Palumbo ◽  
P. Kirsch ◽  
S.A. Krishnan ◽  
...  
Keyword(s):  
Gate Stacks ◽  
Metal Gate ◽  
Novel Approach ◽  
High K

Characterization of Inversion-Layer Capacitance of Electrons in High- $k$/Metal Gate Stacks

2010 ◽  
Vol 57 (11) ◽  
pp. 2814-2820 ◽  
Author(s):  
Ryosuke Iijima ◽  
Lisa F. Edge ◽  
Vamsi Paruchuri ◽  
Mariko Takayanagi
Keyword(s):  
Inversion Layer ◽  
Gate Stacks ◽  
Metal Gate ◽  
High K

In depth characterization of electrical effects of dopants (Al, La, Mg, N) in high-k/metal gate stacks

2011 ◽  
Author(s):  
G. Reimbold ◽  
M. Cassé ◽  
X. Garros ◽  
C. Leroux ◽  
M. Charbonnier ◽  
...  
Keyword(s):  
Gate Stacks ◽  
Metal Gate ◽  
High K

Enhanced degradation of n-MOSFETs with high-k/metal gate stacks under channel hot-carrier/gate-induced drain leakage alternating stress

2012 ◽  
Vol 52 (9-10) ◽  
pp. 1901-1904 ◽  
Author(s):  
Dongwoo Kim ◽  
Seonhaeng Lee ◽  
Cheolgyu Kim ◽  
Chiho Lee ◽  
Jeongsoo Park ◽  
...  
Keyword(s):  
Gate Stacks ◽  
Metal Gate ◽  
Hot Carrier ◽  
High K ◽  
Enhanced Degradation

Bottom-up method for work function tuning in high-k/metal gate stacks in advanced CMOS technologies

2011 ◽  
Author(s):  
Mrunal A. Khaderbad ◽  
Rohit Pandharipande ◽  
Aradhana Gautam ◽  
Abhishek Mishra ◽  
Meenakshi Bhaisare ◽  
...  
Keyword(s):  
Work Function ◽  
Gate Stacks ◽  
Metal Gate ◽  
Bottom Up ◽  
High K ◽  
Work Function Tuning

Interplay between Dry Etch and Wet Clean in Patterning La2O3/HfO2 Containing High-k/metal Gate Stacks

2019 ◽  
Vol 25 (5) ◽  
pp. 29-36
Author(s):  
Ingrid Vos ◽  
David Hellin ◽  
Christa Vrancken ◽  
Jef Geypen ◽  
Hugo Bender ◽  
...  
Keyword(s):  
Gate Stacks ◽  
Metal Gate ◽  
High K ◽  
Dry Etch
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