In depth characterization of electrical effects of dopants (Al, La, Mg, N) in high-k/metal gate stacks
2008 ◽
Vol 48
(11-12)
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pp. 1759-1764
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2010 ◽
Vol 57
(11)
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pp. 2814-2820
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Keyword(s):
2012 ◽
Vol 52
(9-10)
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pp. 1901-1904
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