In-situX-ray Photoemission Spectroscopy Study of Atomic Layer Deposition of TiO2on Silicon Substrate

Japanese Journal of Applied Physics ◽

10.7567/jjap.51.031102 ◽

2012 ◽

Vol 51 (3R) ◽

pp. 031102 ◽

Author(s):

Seung Youb Lee ◽

Cheolho Jeon ◽

Seok Hwan Kim ◽

Yooseok Kim ◽

Woosung Jung ◽

...

Keyword(s):

Atomic Layer Deposition ◽

Silicon Substrate ◽

Atomic Layer ◽

Photoemission Spectroscopy ◽

Spectroscopy Study ◽

Layer Deposition

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In-situX-ray Photoemission Spectroscopy Study of Atomic Layer Deposition of TiO$_{2}$ on Silicon Substrate

Japanese Journal of Applied Physics ◽

10.1143/jjap.51.031102 ◽

2012 ◽

Vol 51 ◽

pp. 031102 ◽

Author(s):

Seung Youb Lee ◽

Cheolho Jeon ◽

Seok Hwan Kim ◽

Yooseok Kim ◽

Woosung Jung ◽

...

Keyword(s):

Atomic Layer Deposition ◽

Silicon Substrate ◽

Atomic Layer ◽

Photoemission Spectroscopy ◽

Spectroscopy Study ◽

Layer Deposition

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Initial reactions of ultrathin HfO2 films by in situ atomic layer deposition: An in situ synchrotron photoemission spectroscopy study

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.5015946 ◽

2018 ◽

Vol 36 (2) ◽

pp. 02D402

Author(s):

Seok Hwan Kim ◽

Wooseok Song ◽

In Su Jeon ◽

Sun Sook Lee ◽

Taek-Mo Chung ◽

...

Keyword(s):

Atomic Layer Deposition ◽

Atomic Layer ◽

Photoemission Spectroscopy ◽

Spectroscopy Study ◽

Layer Deposition

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In-Situ Synchrotron Radiation Photoemission Spectroscopy Study of the Initial Atomic Layer Deposition of Al2O3 Film on Si(001) Substrate

Journal of Nanoscience and Nanotechnology ◽

10.1166/jnn.2011.3629 ◽

2011 ◽

Vol 11 (5) ◽

pp. 4328-4332 ◽

Author(s):

S. H. Kim ◽

B. K. Lee ◽

J. Baik ◽

C. Jeon ◽

S. S. Lee ◽

...

Keyword(s):

Synchrotron Radiation ◽

Atomic Layer Deposition ◽

Atomic Layer ◽

Photoemission Spectroscopy ◽

Spectroscopy Study ◽

Layer Deposition ◽

Synchrotron Radiation Photoemission

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In situ infrared spectroscopy study of the interface self-cleaning during the atomic layer deposition of HfO2 on GaAs(100) surfaces

Applied Physics Letters ◽

10.1063/1.4896501 ◽

2014 ◽

Vol 105 (12) ◽

pp. 121604 ◽

Author(s):

Liwang Ye ◽

Theodosia Gougousi

Keyword(s):

Infrared Spectroscopy ◽

Atomic Layer Deposition ◽

Atomic Layer ◽

Spectroscopy Study ◽

Layer Deposition ◽

Self Cleaning ◽

In Situ Infrared Spectroscopy

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Electronic structure investigation of atomic layer deposition ruthenium(oxide) thin films using photoemission spectroscopy

Journal of Applied Physics ◽

10.1063/1.4928462 ◽

2015 ◽

Vol 118 (6) ◽

pp. 065306 ◽

Author(s):

Michael Schaefer ◽

Rudy Schlaf

Keyword(s):

Electronic Structure ◽

Atomic Layer Deposition ◽

Ruthenium Oxide ◽

Atomic Layer ◽

Photoemission Spectroscopy ◽

Structure Investigation ◽

Oxide Thin Films ◽

Layer Deposition

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X-ray absorption spectroscopy study of Yb2O3 and Lu2O3 thin films deposited on Si(100) by atomic layer deposition

Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms ◽

10.1016/j.nimb.2005.12.020 ◽

2006 ◽

Vol 246 (1) ◽

pp. 90-95 ◽

Author(s):

M. Malvestuto ◽

G. Scarel ◽

C. Wiemer ◽

M. Fanciulli ◽

F. D’Acapito ◽

...

Keyword(s):

Atomic Layer Deposition ◽

Absorption Spectroscopy ◽

Atomic Layer ◽

Spectroscopy Study ◽

X Ray ◽

Layer Deposition ◽

X Ray Absorption

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In-system photoelectron spectroscopy study of tin oxide layers produced from tetrakis(dimethylamino)tin by plasma enhanced atomic layer deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.5015967 ◽

2018 ◽

Vol 36 (2) ◽

pp. 02D401 ◽

Author(s):

Ganna Chistiakova ◽

Mathias Mews ◽

Regan G. Wilks ◽

Marcus Bär ◽

Lars Korte

Keyword(s):

Atomic Layer Deposition ◽

Tin Oxide ◽

Photoelectron Spectroscopy ◽

Atomic Layer ◽

Spectroscopy Study ◽

Oxide Layers ◽

Layer Deposition

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Assessment of Energy Barriers Between ZrCuAlNi Amorphous Metal and Atomic Layer Deposition Insulators Using Internal Photoemission Spectroscopy

physica status solidi (RRL) - Rapid Research Letters ◽

10.1002/pssr.201700437 ◽

2018 ◽

Vol 12 (3) ◽

pp. 1700437 ◽

Author(s):

Melanie A. Jenkins ◽

Tyler Klarr ◽

Dustin Z. Austin ◽

Wei Li ◽

Nhan V. Nguyen ◽

...

Keyword(s):

Atomic Layer Deposition ◽

Atomic Layer ◽

Amorphous Metal ◽

Photoemission Spectroscopy ◽

Energy Barriers ◽

Internal Photoemission ◽

Layer Deposition

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In Situ Auger Electron Spectroscopy Study of Atomic Layer Deposition: Growth Initiation and Interface Formation Reactions during Ruthenium ALD on Si−H, SiO2, and HfO2Surfaces

Langmuir ◽

10.1021/la061898u ◽

2007 ◽

Vol 23 (11) ◽

pp. 6106-6112 ◽

Author(s):

Kie Jin Park ◽

David B. Terry ◽

S. Michael Stewart ◽

Gregory N. Parsons

Keyword(s):

Atomic Layer Deposition ◽

Auger Electron Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

Atomic Layer ◽

Spectroscopy Study ◽

Interface Formation ◽

Layer Deposition ◽

Growth Initiation

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Near Ambient Pressure X-ray Photoelectron Spectroscopy Study of the Atomic Layer Deposition of TiO2 on RuO2(110)

The Journal of Physical Chemistry C ◽

10.1021/acs.jpcc.5b08699 ◽

2015 ◽

Vol 120 (1) ◽

pp. 243-251 ◽

Author(s):

Ashley R. Head ◽

Shilpi Chaudhary ◽

Giorgia Olivieri ◽

Fabrice Bournel ◽

Jesper N. Andersen ◽

...

Keyword(s):

Atomic Layer Deposition ◽

Photoelectron Spectroscopy ◽

Ambient Pressure ◽

Atomic Layer ◽

Spectroscopy Study ◽

X Ray ◽

Layer Deposition

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