Initial reactions of ultrathin HfO2 films by in situ atomic layer deposition: An in situ synchrotron photoemission spectroscopy study

2018 ◽  
Vol 36 (2) ◽  
pp. 02D402
Author(s):  
Seok Hwan Kim ◽  
Wooseok Song ◽  
In Su Jeon ◽  
Sun Sook Lee ◽  
Taek-Mo Chung ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Photoemission Spectroscopy ◽  
Spectroscopy Study ◽  
Layer Deposition

In-situX-ray Photoemission Spectroscopy Study of Atomic Layer Deposition of TiO2on Silicon Substrate

2012 ◽  
Vol 51 (3R) ◽  
pp. 031102 ◽  
Author(s):  
Seung Youb Lee ◽  
Cheolho Jeon ◽  
Seok Hwan Kim ◽  
Yooseok Kim ◽  
Woosung Jung ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Silicon Substrate ◽  
Atomic Layer ◽  
Photoemission Spectroscopy ◽  
Spectroscopy Study ◽  
Layer Deposition

In-situX-ray Photoemission Spectroscopy Study of Atomic Layer Deposition of TiO$_{2}$ on Silicon Substrate

2012 ◽  
Vol 51 ◽  
pp. 031102 ◽  
Author(s):  
Seung Youb Lee ◽  
Cheolho Jeon ◽  
Seok Hwan Kim ◽  
Yooseok Kim ◽  
Woosung Jung ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Silicon Substrate ◽  
Atomic Layer ◽  
Photoemission Spectroscopy ◽  
Spectroscopy Study ◽  
Layer Deposition
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