Effect of Nitrogen Flow Ratio on Composition, Microstructure, and Mechanical Properties of Cr–B–O–N Films Deposited by Pulsed Direct Current Magnetron Sputtering

2019 ◽  
Vol 19 (10) ◽  
pp. 6826-6833
Author(s):  
Ji Cheng Ding ◽  
Teng Fei Zhang ◽  
Rong Guang Jin ◽  
Damin Lee ◽  
Qi Min Wang ◽  
...  
Keyword(s):  
Mechanical Properties ◽  
Magnetron Sputtering ◽  
Direct Current ◽  
Nitrogen Flow ◽  
Flow Ratio ◽  
Microstructure And Mechanical Properties ◽  
Direct Current Magnetron Sputtering ◽  
Pulsed Direct Current

Nano-Scratch Response of Diamond-Like Carbon Film Deposited by Pulsed Direct Current Magnetron Sputtering

2020 ◽  
Vol 8 (2) ◽  
pp. 19-37 ◽  
Author(s):  
T. Koch ◽  
M. Lackner ◽  
A. Pauschitz ◽  
Manish Roy
Keyword(s):  
Mechanical Properties ◽  
Magnetron Sputtering ◽  
Direct Current ◽  
Carbon Film ◽  
Structural Disorder ◽  
High Load ◽  
Diamond Like Carbon ◽  
Low Load ◽  
Direct Current Magnetron Sputtering ◽  
Pulsed Direct Current

Diamond-like carbon (DLC) films are known for thermal, chemical and mechanical properties. Hydrogen free and hydrogenated DLC films are deposited using pulsed direct current magnetron sputtering. The influence of sputtering conditions on the nano-scratch properties of these films is investigated. Raman spectra reveals that structural disorder in the a-C:H matrix decreases with increase in acetylene flow. Increased acetylene flow reduces frictions, residual stress and retains hardness. The friction responses of the deposited defects free ultra-smooth films are influenced by pull off forces at low load and by formation of carbonaceous layer at high load.

scholarly journals Effects of Nitrogen Flow Ratio on Structures, Bonding Characteristics, and Mechanical Properties of ZrNx Films

Coatings ◽  
2020 ◽  
Vol 10 (5) ◽  
pp. 476 ◽  
Author(s):  
Yi-En Ke ◽  
Yung-I Chen
Keyword(s):  
Mechanical Properties ◽  
Photoelectron Spectroscopy ◽  
Structural Variation ◽  
Nitrogen Flow ◽  
Flow Ratio ◽  
X Ray ◽  
Direct Current Magnetron Sputtering ◽  
Nanoindentation Hardness ◽  
Bonding Characteristics ◽  
Dominant Phase

ZrNx (x = 0.67–1.38) films were fabricated through direct current magnetron sputtering by a varying nitrogen flow ratio [N2/(Ar + N2)] ranging from 0.4 to 1.0. The structural variation, bonding characteristics, and mechanical properties of the ZrNx films were investigated. The results indicated that the structure of the films prepared using a nitrogen flow ratio of 0.4 exhibited a crystalline cubic ZrN phase. The phase gradually changed to a mixture of crystalline ZrN and orthorhombic Zr3N4 followed by a Zr3N4 dominant phase as the N2 flow ratio increased up to >0.5 and >0.85, respectively. The bonding characteristics of the ZrNx films comprising Zr–N bonds of ZrN and Zr3N4 compounds were examined by X-ray photoelectron spectroscopy and were well correlated with the structural variation. With the formation of orthorhombic Zr3N4, the nanoindentation hardness and Young’s modulus levels of the ZrNx (x = 0.92–1.38) films exhibited insignificant variations ranging from 18.3 to 19.0 GPa and from 210 to 234 GPa, respectively.

Residual stress control of Cu film deposited using a pulsed direct current magnetron sputtering

2018 ◽  
Vol 660 ◽  
pp. 601-605 ◽  
Author(s):  
Tae Hyung Kim ◽  
Soo Jung Lee ◽  
Do Han Kim ◽  
Dong Woo Kim ◽  
Jeong Woon Bae ◽  
...  
Keyword(s):  
Residual Stress ◽  
Magnetron Sputtering ◽  
Direct Current ◽  
Stress Control ◽  
Cu Film ◽  
Direct Current Magnetron Sputtering ◽  
Pulsed Direct Current
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