Electrical, Optical and Structural Properties of AZO Thin Film Deposited Using Facing Targets Magnetron Sputtering System with Inductively Coupled Plasma

Science of Advanced Materials ◽

10.1166/sam.2015.2088 ◽

2015 ◽

Vol 7 (1) ◽

pp. 107-112 ◽

Author(s):

Hye R. Kim ◽

Jay B. Kim ◽

Yoon S. Choi ◽

M. Hori ◽

Jeon G. Han

Keyword(s):

Thin Film ◽

Magnetron Sputtering ◽

Structural Properties ◽

Inductively Coupled Plasma ◽

Inductively Coupled ◽

Azo Thin Film ◽

Sputtering System

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Deposition of AZO thin film using RF and ICP at facing magnetron sputtering system

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2014.07.035 ◽

2014 ◽

Vol 259 ◽

pp. 39-43 ◽

Author(s):

Hye Ran Kim ◽

Jay Bum Kim ◽

Yoon Seok Choi ◽

Masaru Hori ◽

Jeon Geon Han

Keyword(s):

Thin Film ◽

Magnetron Sputtering ◽

Azo Thin Film ◽

Sputtering System

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Effectiveness of hydrogen dilution for designing amorphous to crystalline Si thin film in inductively coupled plasma assisted magnetron sputtering

Japanese Journal of Applied Physics ◽

10.7567/jjap.54.060303 ◽

2015 ◽

Vol 54 (6) ◽

pp. 060303 ◽

Author(s):

Kyung Sik Shin ◽

Bibhuti Bhusan Sahu ◽

Jeon Geon Han ◽

Masaru Hori

Keyword(s):

Thin Film ◽

Magnetron Sputtering ◽

Inductively Coupled Plasma ◽

Inductively Coupled ◽

Hydrogen Dilution ◽

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Dependence of Substrate DC Bias Voltage on Structural Properties of Nickel Thin Films Using Magnetron Sputtering with Multipolar Magnetic Plasma Confinement Assisted by Inductively Coupled Plasma

Shinku ◽

10.3131/jvsj.49.156 ◽

2006 ◽

Vol 49 (3) ◽

pp. 156-158 ◽

Author(s):

Kazuaki TAKESAKO ◽

Yuta OKAYAMA ◽

Keishi KAWABATA

Keyword(s):

Magnetron Sputtering ◽

Structural Properties ◽

Bias Voltage ◽

Inductively Coupled Plasma ◽

Plasma Confinement ◽

Inductively Coupled ◽

Nickel Thin Films ◽

Dc Bias ◽

Magnetic Plasma

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Fabrication of Tantalum nitride thin film using the low vacuum magnetron sputtering system

IOP Conference Series Materials Science and Engineering ◽

10.1088/1757-899x/18/9/092032 ◽

2011 ◽

Vol 18 (9) ◽

pp. 092032 ◽

Author(s):

Takashi Hashizume ◽

Atsushi Saiki ◽

Kiyoshi Terayama

Keyword(s):

Thin Film ◽

Magnetron Sputtering ◽

Tantalum Nitride ◽

Tantalum Nitride Thin Film ◽

Sputtering System

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Plasma-Enhanced Reactive Magnetron Sputtering Assisted with Inductively Coupled Plasma for Reactivity-Controlled Deposition of Microcrystalline Silicon Thin Films

Japanese Journal of Applied Physics ◽

10.7567/jjap.52.11nb05 ◽

2013 ◽

Vol 52 (11S) ◽

pp. 11NB05 ◽

Author(s):

Kosuke Takenaka ◽

Yuichi Setsuhara ◽

Akinori Ebe

Keyword(s):

Magnetron Sputtering ◽

Inductively Coupled Plasma ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Microcrystalline Silicon ◽

Inductively Coupled ◽

Silicon Thin Films ◽

Controlled Deposition

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A Comparative Study of Nanocrystalline TiAlN Coatings Fabricated by Direct Current and Inductively Coupled Plasma Assisted Magnetron Sputtering

Journal of the Korean Ceramic Society ◽

10.4191/kcers.2014.51.5.375 ◽

2014 ◽

Vol 51 (5) ◽

pp. 375-379 ◽

Author(s):

Sung-Yong Chun ◽

Se-Chul Kim

Keyword(s):

Magnetron Sputtering ◽

Comparative Study ◽

Direct Current ◽

Inductively Coupled Plasma ◽

Inductively Coupled

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Preparation of a ‐ SiN x Thin Film with Low Hydrogen Content by Inductively Coupled Plasma Enhanced Chemical Vapor Deposition

Journal of The Electrochemical Society ◽

10.1149/1.1838318 ◽

1998 ◽

Vol 145 (2) ◽

pp. 652-658 ◽

Author(s):

Sang‐Soo Han ◽

Byung‐Hyuk Jun ◽

Kwangsoo No ◽

Byeong‐Soo Bae

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Hydrogen Content ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Inductively Coupled

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Effects of growth variables on the properties of single crystalline ZnO thin film grown by inductively coupled plasma metal organic chemical vapor deposition

Thin Solid Films ◽

10.1016/j.tsf.2009.01.008 ◽

2009 ◽

Vol 517 (15) ◽

pp. 4432-4435 ◽

Author(s):

Ju-Hoon Park ◽

Chang-Bae Lee ◽

Il-Soo Kim ◽

Seong-Joo Jang ◽

Byung-Teak Lee

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Organic Chemical ◽

Zno Thin Film ◽

Inductively Coupled ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

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Growth dynamics and characterization of SiC quantum dots synthesized by low-frequency inductively coupled plasma assisted rf magnetron sputtering

Journal of Applied Physics ◽

10.1063/1.2724791 ◽

2007 ◽

Vol 101 (9) ◽

pp. 094304 ◽

Author(s):

Q. J. Cheng ◽

J. D. Long ◽

S. Xu

Keyword(s):

Quantum Dots ◽

Magnetron Sputtering ◽

Inductively Coupled Plasma ◽

Low Frequency ◽

Growth Dynamics ◽

Rf Magnetron Sputtering ◽

Inductively Coupled

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Etch Characteristics of Cu Thin Film Using Inductively Coupled Plasma of Non-Greenhouse Gases

ECS Meeting Abstracts ◽

10.1149/ma2018-01/46/2652 ◽

2018 ◽

Keyword(s):

Thin Film ◽

Greenhouse Gases ◽

Inductively Coupled Plasma ◽

Inductively Coupled ◽

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