Tunable physical properties of Al-doped ZnO thin films by O2 and Ar plasma treatments

Al-doped ZnO (AZO) is a promising transparent conducting oxide that can replace indium tin oxide (ITO) owing to its excellent flexibility and eco-friendly characteristics. However, it is difficult to immediately replace ITO with AZO because of the difference in their physical properties. Here, we study the changes in the physical properties of AZO thin films using Ar and O2 plasma treatments. Ar plasma treatment causes the changes in the surface and physical properties of the AZO thin film. The surface roughness of the AZO thin film decreases, the work function and bandgap slightly increase, and the sheet resistance significantly decreases. In contrast, a large work function change is observed in the AZO thin film treated with O2 plasma; however, the change in other characteristics is not significant. Therefore, the results indicate that post-treatment using plasma can accelerate the development of high-performance transparent devices.

Near infrared photothermoelectric effect in transparent AZO/ITO/Ag/ITO thin films

A new concept of oxide-metal-oxide structures that combine photothermoelectric effect with high reflectance (~ 80%) at wavelengths in the infrared (> 1100 nm) and high transmittance in the visible range is reported here. This was observed in optimized ITO/Ag/ITO structure, 20 nm of Silver (Ag) and 40 nm of Indium Tin Oxide (ITO), deposited on Aluminum doped Zinc Oxide (AZO) thin film. These layers show high energy saving efficiency by keeping the temperature constant inside a glazed compartment under solar radiation, but additionally they also show a photothermoelectric effect. Under uniform heating of the sample a thermoelectric effect is observed (S = 40 mV/K), but when irradiated, a potential proportional to the intensity of the radiation is also observed. Therefore, in addition to thermal control in windows, these low emission coatings can be applied as transparent photothermoelectric devices.

Location-Optoelectronic Property Correlation in ZnO:Al Thin Film by RF Magnetron Sputtering and Its Photovoltaic Application

In this study, a radio-frequency magnetron sputter system was used to deposit Al2O3 doped ZnO (AZO) thin films at room temperature, and the soda lime glass (SLG) substrates were placed at different zones relative to the center of the sample holder under the target. The samples were then analyzed using an X-ray diffractometer, Hall-effect measurement system, UV-visible spectrophotometer, and X-ray photoelectron spectroscopy. It was found that the electrical, structural, and optical properties of AZO films strongly depend on the target racetrack. The AZO thin film grown at a location outside the racetrack not only has the most suitable figure of merit for transparent conductive films, but also retains the least residual stress, which makes it the most suitable candidate for use as a CZTSe transparent conductive layer. When applied to CZTSe solar cells, the photoelectric efficiency is 3.56%.

Near Infrared Photothermoelectric Effect in Transparent AZO/ITO/Ag/ITO Thin Films

A new concept of oxide-metal-oxide structures that combine photothermoelectric effect with high reflectance (~80%) at wavelengths in the infrared (> 1100 nm) and high transmittance in the visible range is reported here. This was observed in optimized ITO/Ag/ITO structure, 20 nm of Siver (Ag) and 40 nm of Indium Tin Oxide (ITO), deposited on Aluminum doped Zinc Oxide (AZO) thin film. These layers show high energy saving efficiency by keeping the temperature constant inside a glazed compartment under solar radiation, but additionally they also show a photothermoelectric effect. Under uniform heating of the sample a thermoelectric effect is observed (S = 40 μV/K), but when irradiated, a potential proportional to the intensity of the radiation is also observed. Therefore, in addition to thermal control in windows, these low emission coatings can be applied as transparent photothermoelectric devices.

Aluminum doped zinc oxide deposited by atomic layer deposition and its applications to micro/nano devices

This work reports investigation on the deposition and evaluation of an aluminum-doped zinc oxide (AZO) thin film and its novel applications to micro- and nano-devices. The AZO thin film is deposited successfully by atomic layer deposition (ALD). 50 nm-thick AZO film with high uniformity is checked by scanning electron microscopy. The element composition of the deposited film with various aluminum dopant concentration is analyzed by energy-dispersive X-ray spectroscopy. In addition, a polycrystalline feature of the deposited film is confirmed by selected area electron diffraction and high-resolution transmission electron microscopy. The lowest sheet resistance of the deposited AZO film is found at 0.7 kΩ/□ with the aluminum dopant concentration at 5 at.%. A novel method employed the ALD in combination with the sacrificial silicon structures is proposed which opens the way to create the ultra-high aspect ratio AZO structures. Moreover, based on this finding, three kinds of micro- and nano-devices employing the deposited AZO thin film have been proposed and demonstrated. Firstly, nanowalled micro-hollows with an aspect ratio of 300 and a height of 15 µm are successfully produced . Secondly, micro- and nano-fluidics, including a hollow fluidic channel with a nanowall structure as a resonator and a fluidic capillary window as an optical modulator is proposed and demonstrated. Lastly, nanomechanical resonators consisting of a bridged nanobeam structure and a vertical nanomechanical capacitive resonator are fabricated and evaluated.

Effect of annealing on the morphology and the optical characterization of the AZO:Co thin film prepared by Sol–Gel process

In this work, the ZnO thin film, the Al-doped ZnO (AZO) thin film (0.98M ZnO, 0.02M Al) and the (Al,Co) co-doped ZnO thin film (AZO:Co) (0.95M ZnO, 0.02M Al, 0.03M Co) were deposited on the glass substrate by the Sol–Gel method. We fabricated a sample of the ZnO thin film, a sample of the AZO thin film and three samples of AZO:Co thin films. The spin-coating was used to deposit thin film on the glass substrate. The ZnO and the AZO thin films were annealed at 450[Formula: see text]C while three samples of the AZO:Co thin films were annealed at 300[Formula: see text]C, 450[Formula: see text]C and 600[Formula: see text]C in air for 60 min, respectively. In order to prepare three samples of the AZO:Co thin films, we deposited the (Al,Co) co-doped ZnO on the glass substrate for 20 s then all samples were per-heated at 80[Formula: see text]C for 10 min. we repeated this deposition process five times for each sample. Finally, three samples were annealed at 300[Formula: see text]C, 450[Formula: see text]C and 600[Formula: see text]C in air for 60 min, respectively. The procedure to prepare of the ZnO and AZO thin films was like the AZO:Co thin films except that the annealing temperature was 450[Formula: see text]C. The structural and optical properties of the thin films were investigated by X-ray diffraction technique, UV-Vis spectrophotometer and Field Emission Scanning Electron Microscopy (FESEM). Results indicated that (Al,Co) co-doping in the ZnO thin film improve the optical transmission while changes in the lattice structure is small with respect to the AZO thin film. Also, the AZO:Co thin film which was annealed at 450[Formula: see text]C exhibited simultaneously the high thickness and high optical transmission.

Preparation and Characterization of Sol-Gel Dip Coated Al: ZnO (AZO) Thin Film for Opto-electronic Application

Aluminum doped zinc oxide (AZO) thin film was prepared by sol–gel dip coating method from methanol and monoethanolamine respectively, used as solvent and stabilizer agent. From the XRD study, it was confirmed that the aluminum was incorporated into the ZnO lattice. The prepared film have polycrystalline in nature and the film exhibit hexagonal wurtzite structure with (002) direction. SEM and AFM studies showed well defined smooth and uniformed wrinkle shaped grains distributed regularly on to the entire glass substrate without any pinholes and cracks. From the optical study, the observed highest transmittance was about 82% in the visible range and the band gap is 3.15 eV. Room temperature PL spectra exhibited a strong UV emission peak located at 390 nm for the deposited film. The electrical properties of the AZO thin film was studied by Hall-Effect measurement and found that it has n-type conductivity with low resistivity (ρ) of about 9.06 × 10^–3 Ω cm.