Electrical and Structural Properties of Thin Palladium Films
1986 ◽
Vol 41
(4)
◽
pp. 665-670
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Keyword(s):
X Ray
◽
The electrical resistivity of thin palladium films deposited on amorphous substrates is measured in dependence on film thickness. The data are interpreted with the help of a statistical model taking into account structural information obtained from AES, TEM and x-ray diffraction texture analysis. The steep decrease of resistivity in the ultra-thin thickness region can be immediately correlated with the formation of coherent areas in the films. A more flattened course is reached at about 8 nm thickness where a continuous film structure develops.