scholarly journals Effects of Deposition Temperature on the Properties of ZnO Films Grown by High Power Impulse Magnetron Sputtering

2017 ◽  
Vol 4 (2) ◽  
pp. 82-86
Author(s):  
Yan Yuan ◽  
Keyword(s):  
Magnetron Sputtering ◽  
High Power ◽  
Deposition Temperature ◽  
Zno Films

scholarly journals Reactive High-Power Impulse Magnetron Sputtering of Chromium-Carbon Films

Coatings ◽  
2020 ◽  
Vol 10 (12) ◽  
pp. 1269
Author(s):  
Chin-Chiuan Kuo ◽  
Chun-Hui Lin ◽  
Jing-Tang Chang ◽  
Yu-Tse Lin
Keyword(s):  
Magnetron Sputtering ◽  
Amorphous Carbon ◽  
High Power ◽  
Deposition Temperature ◽  
Average Power ◽  
Carbon Films ◽  
Strengthening Effect ◽  
Substrate Bias ◽  
Hydrogenated Amorphous Carbon ◽  
Hydrogenated Amorphous

Chromium-carbon films were deposited by utilizing reactive high-power impulse magnetron sputtering at different mixture ratios of ethyne and argon atmosphere, and different substrate bias voltages and deposition temperature, with the same pulse frequency, duty cycle, and average power. The microstructure and mechanical properties of the obtained films were compared. The films consist of amorphous or nanocrystalline chromium carbide, hydrogenated amorphous carbon, and minor α-chromium phase. Decreasing the fraction of ethyne increases the content of the α-chromium phase but decreases hydrogenated amorphous carbon phase. The film’s hardness increases by enhancing the negative substrate bias and raising the deposition temperature, which could be attributed to the increase of film density and the Hall–Petch strengthening effect induced by the nanoscale crystallization of the amorphous carbide phase.

scholarly journals Room temperature deposition of homogeneous, highly transparent and conductive Al-doped ZnO films by reactive high power impulse magnetron sputtering

2016 ◽  
Vol 157 ◽  
pp. 742-749 ◽  
Author(s):  
Martin Mickan ◽  
Ulf Helmersson ◽  
Hervé Rinnert ◽  
Jaafar Ghanbaja ◽  
Dominique Muller ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
High Power ◽  
Room Temperature ◽  
Zno Films ◽  
Temperature Deposition ◽  
Doped Zno

Characterization and device applications of ZnO films deposited by high power impulse magnetron sputtering (HiPIMS)

2013 ◽  
Vol 46 (16) ◽  
pp. 165105 ◽  
Author(s):  
J G Partridge ◽  
E L H Mayes ◽  
N L McDougall ◽  
M M M Bilek ◽  
D G McCulloch
Keyword(s):  
Magnetron Sputtering ◽  
High Power ◽  
Zno Films ◽  
Device Applications

Effect of Sputtering Pressure on Al-doped ZnO Films by DC Magnetron Sputtering

2013 ◽  
Vol 27 (10) ◽  
pp. 1112-1116 ◽  
Author(s):  
Ke-Wei SUN ◽  
Wan-Cheng ZHOU ◽  
Shan-Shan HUANG ◽  
Xiu-Feng TANG
Keyword(s):  
Magnetron Sputtering ◽  
Zno Films ◽  
Dc Magnetron Sputtering ◽  
Doped Zno ◽  
Sputtering Pressure
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