Electroless copper films deposited onto laser-activated aluminum nitride and alumina

1994 ◽  
Vol 9 (4) ◽  
pp. 1019-1027 ◽  
Author(s):  
M. J. DeSilva ◽  
A. J. Pedraza ◽  
D.H. Lowndes
Keyword(s):  
Energy Density ◽  
Aluminum Nitride ◽  
Laser Irradiation ◽  
Laser Energy ◽  
Annealing Treatment ◽  
Surface Region ◽  
Laser Energy Density ◽  
Copper Films ◽  
Near Surface ◽  
Electroless Copper

Metallization of ceramic substrates by laser activation and subsequent electroless deposition has been demonstrated recently in aluminum nitride and alumina. However, the bond strength between the electroless copper and the ceiamic substrate is weak (less than 14 MPa). Low temperature annealing of electroless copper films deposited on substrates activated at low laser energies strongly increases the adhesion strength. The effectiveness of the annealing for improving the metal-ceramic bonding is dependent upon the laser treatment performed on the substrate prior to deposition. Faster deposition kinetics are obtained for both substrates by increasing the laser energy density. On the other hand, an increase in the laser energy density leads to poor adhesion strengths. The dislocation microstructure produced during laser irradiation in aluminum nitride is analyzed as a possible cause of laser activation. Free aluminum produced by laser irradiation of aluminum nitride and of alumina is discussed as another factor of laser activation. The chemical and microstructural changes taking place in the near-surface region as a consequence of laser-induced processes are correlated with adhesion enhancement promoted by the annealing treatment.

Microstructural changes of Aluminum Nitride after laser irradiation and electroless copper deposition

1994 ◽  
Vol 52 ◽  
pp. 636-637
Author(s):  
S. Cao ◽  
A. J. Pedraza ◽  
L. F. Allard
Keyword(s):  
Aluminum Nitride ◽  
Laser Irradiation ◽  
Electroless Deposition ◽  
Thermal Evaporation ◽  
Surface Region ◽  
Near Surface ◽  
Laser Patterning ◽  
Electroless Copper ◽  
Excimer Laser Irradiation ◽  
Laser Effect

Excimer-laser irradiation strongly modifies the near-surface region of aluminum nitride (AIN) substrates. The surface acquires a distinctive metallic appearance and the electrical resistivity of the near-surface region drastically decreases after laser irradiation. These results indicate that Al forms at the surface as a result of the decomposition of the Al (which has been confirmed by XPS). A computer model that incorporates two opposing phenomena, decomposition of the AIN that leaves a metallic Al film on the surface, and thermal evaporation of the Al, demonstrated that saturation of film thickness and, hence, of electrical resistance is reached when the rate of Al evaporation equals the rate of AIN decomposition. In an electroless copper bath, Cu is only deposited in laser-irradiated areas. This laser effect has been designated laser activation for electroless deposition. Laser activation eliminates the need of seeding for nucleating the initial layer of electroless Cu. Thus, AIN metallization can be achieved by laser patterning followed by electroless deposition.

Excimer Laser Irradiation of Metallic Films on Ceramic Substrates

1991 ◽  
Vol 235 ◽  
Author(s):  
M. J. Godbole ◽  
A. J. Pedraza ◽  
D. H. Lowndes ◽  
J. R. Thompson
Keyword(s):  
Energy Density ◽  
Laser Irradiation ◽  
Surface Region ◽  
Copper Films ◽  
Metallic Films ◽  
Ceramic Substrates ◽  
Near Surface ◽  
Excimer Laser Irradiation ◽  
Sputter Deposited ◽  
Density Threshold

ABSTRACTCopper films sputter deposited on mechanically polished (optical finish) and on annealed substrates were laser-irradiated at various energy densities. The effect of the substrate condition on both the evaporation threshold and the morphology of the laser-irradiated metallic films was investigated. The energy density threshold for laser-induced evaporation of the copper films was studied using energy dispersive x-ray spectroscopy (EDS) in a scanning electron microscope (SEM). It was found that for annealed substrates the energy density threshold decreases relative to the threshold for the as-polished condition. These results are compared with predictions of a mathematical model that assumes that the near surface region of the as-polished ceramic is a highly damaged region and, thus, constitutes a thermal barrier. The film remains intact and with almost no change in morphology after laser irradiation at energy densities lower than 0.80 J/cm2 if the substrate has been previously annealed. On the other hand, copper films deposited on as-polished substrates break up during laser processing forming copper islands.

Er-Doping in Silicon by Pulsed Laser Irradiation

1993 ◽  
Vol 301 ◽  
Author(s):  
Kenshiro Nakashima
Keyword(s):  
Energy Density ◽  
Laser Irradiation ◽  
Laser Energy ◽  
Pulsed Laser ◽  
Laser Energy Density ◽  
Er Doping ◽  
Erbium Ions ◽  
State Regime ◽  
Er Doped ◽  
Pulsed Laser Irradiation

ABSTRACTErbium ions were successfully doped in silicon by pulsed laser irradiation above the threshold laser energy density. Photoluminescence peaks at 1.54, 1.59 and 1.64 µm from Er-optical centers were observed after annealing of Er-doped samples. The intensity of the 1.54 µm Er-emission band increased upon increase in the laser energy density, and then gradually decreased after reaching the maximum, due to the laser sputtering of the silicon substrate. Oxygen atoms, which were unintentionally codoped with Er-ions, were found to be distributed in the same region as in Er-ions, and were suggested to play roles to activate Er-optical centers. The maximum concentration of Er-ions doped in the solid state regime were estimated to be the order of 1018 cm−3 by the Rutherford backscattering measurements.

Electrical Properties of Solid Phase Crystallized Silicon Films

2001 ◽  
Vol 664 ◽  
Author(s):  
Tadashi Watanabe ◽  
Hajime Watakabe ◽  
Toshiyuki Sameshima
Keyword(s):  
Heat Treatment ◽  
Electrical Conductivity ◽  
Energy Density ◽  
Laser Irradiation ◽  
Carrier Mobility ◽  
Crystalline Silicon ◽  
Solid Phase ◽  
Laser Energy ◽  
Silicon Films ◽  
Laser Energy Density

ABSTRACTIn this study, the carrier mobility and density for solid phase crystallized (SPC) silicon films fabricated at 600 °C for 48 hours are analyzed by free carrier optical absorption. The carrier mobility is 40 cm2/Vs for SPC films doped with 6×1019-cm−3-phosphorus atoms. This analysis suggests the SPC films have fine crystalline grains closed to single crystalline silicon. In addition, initial carrier density was 3×1019 cm−3, which increased to 6×1019 cm−3by XeCl excimer laser irradiation of 500mJ/cm2. The inactivated regions in SPC films are reduced by laser irradiation. However, the electrical conductivity after laser irradiation for SPC films doped with 6×1018-cm−3-phosphorus atoms decreased from 3.3 to 0.018 S/cm as laser energy density increased to 500mJ/cm2. On the other hand, the electrical conductivity increased from 14.7 to 31.3 S/cm with similar increase of laser energy density after H2O vapor heat treatment at 260°C for 3 hours with 1.3 MPa. Furthermore, the characteristics of n-channel TFTs fabricated with initial SPC films as well as SPC films which was irradiated by laser at 425mJ/cm2 are also researched. The threshold voltage is decreased from 3.8 to 2.0 V by laser irradiation. Threshold voltages of both cases are decreased from 3.8 to 2.4 V for no-laser irradiation and from 2.0 to 0.8 V for laser irradiation, after H2O vapor heat treatment at 310°C for 1 hour with 9.0MPa. Based on the above trial, the defect reduction method combining laser irradiation and H2O vapor heat treatment has proved to be very effective for SPC films and SPC TFTs.

Fast-Pulse Excimer-Laser-Induced Processes in a-Si:H

1989 ◽  
Vol 164 ◽  
Author(s):  
K. Winer ◽  
R.Z. Bachrach ◽  
R.I. Johnson ◽  
S.E. Ready ◽  
G.B. Anderson ◽  
...  
Keyword(s):  
Energy Density ◽  
Excimer Laser ◽  
Impurity Concentration ◽  
Laser Annealing ◽  
Laser Energy ◽  
Laser Energy Density ◽  
Excimer Laser Annealing ◽  
Near Surface ◽  
Pulse Excimer Laser ◽  
Fast Pulse

AbstractThe effects of fast-pulse excimer laser annealing of a-Si:H were investigated by measurements of electronic transport properties and impurity concentration depth profiles as a function of incident laser energy density. The dc dark conductivity of laser-annealed, highly-doped a-Si:H increases by a factor of ∼350 above a sharp laser energy density threshold whose magnitude increases with decreasing impurity concentration and which correlates with the onset of hydrogen evolution from and crystallization of the near-surface layer. The similarities between the preparation and properties of laser-crystallized a-Si:H and pc-Si:H are discussed.

Formation of polytype microstructure in pulsed-laser-irradiated sapphire substrates

1995 ◽  
Vol 53 ◽  
pp. 344-345
Author(s):  
Siqi Cao ◽  
A. J. Pedraza ◽  
L. F. Allard ◽  
D. H. Lowndes
Keyword(s):  
Energy Density ◽  
Laser Irradiation ◽  
Electroless Deposition ◽  
Laser Energy ◽  
Pulsed Laser ◽  
Surface Modifications ◽  
Near Surface ◽  
Sapphire Substrates ◽  
Hcp Structure ◽  
Pulsed Laser Irradiation

Surface modifications of wide-gap materials are produced by pulsed laser irradiation. Under given conditions, these near-surface modifications can promote adhesion enhancement of deposited thin film materials, and activation for electroless deposition. AIN decomposes during laser irradiation leaving a metallic film on the surface. High density dislocations were observed in the surface layer of AIN that was laser melted but not decomposed. The laser melted alumina becomes amorphous at a laser energy density of ~1J/cm2. In sapphire, γ-alumina is formed when the sample is laser irradiated in Ar/4%H2. Here, we report the formation of a new structure in laser-irradiated sapphire.Optically polished c-axis sapphire substrates were laser-irradiated in an Ar/4%H2 atmosphere at 4J/cm2 energy density, using a 308 nm-wavelength laser with a pulse duration of ~40 ns. Sapphire (A12O3) has a space group R 3 c and can be described as an hcp structure having oxygen and aluminum layers alternately stacking along the c-axis.

Raman Measurements on Graphite Modified by High Power Laser Irradiation

1984 ◽  
Vol 35 ◽  
Author(s):  
J. Steinbeck ◽  
G. Braunstein ◽  
M.S. Dresselhaus ◽  
B.S. Elman ◽  
T. Venkatesan
Keyword(s):  
Energy Density ◽  
Laser Pulse ◽  
Laser Irradiation ◽  
High Power ◽  
Laser Energy ◽  
Laser Pulses ◽  
Laser Energy Density ◽  
High Power Laser ◽  
Power Laser ◽  
Raman Microprobe

AbstractThe behavior of highly anisotropic materials under short pulses of high power laser irradiation has been studied by irradiating highly oriented pyrolytic graphite (HOPG) with 30 nsec Ruby-laser pulses with energy densities between 0.1 and 5.0J/cm2. Raman spectroscopy has been used to investigate the laser-induced modifications to the crystalline structure as a function of laser energy density of the laser pulse. A Raman microprobe was used to investigate the spatial variations of these near-surface regions. The irradiation of HOPG with energy densities above ~ 0.6J/cm2 leads to the appearance of the ~ 1360 cm-1 disorder-induced line in the first order Raman spectrum. The intensity of the ~ 1360cm-1 line increases with increasing laser energy density. As the energy density of the laser pulse reaches about 1.0J/cm2, the ~ 1360cm-1 line and the ~ 1580cm-1 Raman-allowed mode broaden and coalesce into a broad asymmetric band, indicating the formation of a highly disordered region, consistent with RBS-channeling measurements. However, as the laser energy density of the laser pulses is further increased above 3.0J/cm2, the two Raman lines narrow and can again be resolved suggesting laser-induced crystallization. The Raman results are consistent with high resolution electron microscopy observations showing the formation of randomly oriented crystallites. Raman Microprobe spectra revealed three separate regions of behavior: (i) an outer unirradiated region where the material appears HOPG-like with a thin layer of material coating the surface, (ii) an inner irradiated region where the structure is uniform, but disordered, and (iii) an intermediate region between the other regions where the structure is highly disordered. The changes in structure of the inner region are consistent with the behavior observed with RBS and conventional Raman spectra. The identification of an amorphous carbon-like layer on the outer region is consistent with a large thermomechanical stress at the graphite surface, introduced by the high power laser pulse, and known to occur in metals.

The effects of Pulsed Green Laser Annealing for Carbon NanoWalls (CNWs)

2013 ◽  
Vol 1505 ◽  
Author(s):  
Norihito Kawaguchi ◽  
Akihiko Yoshimura
Keyword(s):  
Energy Density ◽  
Laser Irradiation ◽  
Laser Annealing ◽  
Laser Energy ◽  
Green Laser ◽  
Laser Energy Density ◽  
Oriented Crystal ◽  
Peak Intensity ◽  
Carbon Nanowalls ◽  
Band Spectra

ABSTRACTThe effects of the pulsed green laser annealing at ambient nitrogen for two different heights-CNWs grown on silicon substrate were investigated on the crystallinity and morphology using Raman spectroscopy, SEM, TEM and XPS. For the 1μm height-CNWs, the peak intensity of D-band spectra decreased as the laser energy density increased up to 1.3Jcm-2, ID/IG ratio decreased from 2.5 to 0.7. The crystallinity of CNWs was improved by the laser irradiation. For the 1μm height-CNWs irradiated above 1.5Jcm-2, the height of CNWs decreased gradually as the laser energy density increased, it was clarified that the surfaces of CNWs were vaporized by the laser irradiation. For the 20μm height-CNWs, the peak intensity of D band spectra also decreased until the laser energy density increased up to 0.8Jcm-2, ID/IG ratio decreased from 1.6 to 0.5. From the TEM observation of CNWs irradiated at 0.8 Jcm-2, it was confirmed that the laser irradiation changed CNWs to be highly oriented crystal structure. However above 0.8Jcm-2, the crystallinity was deteriorated due to the vaporization of CNWs as the same as the 1μm height-CNWs. The pulsed green laser annealing is effective to improve the crystallinity of CNWs on optimal laser energy density for both height-CNWs, the higher laser energy densities vaporized the CNWs and changed the morphology and crystallinity of CNWs.

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