Modeling the Grain Size Distribution during Solid Phase Crystallization of Silicon

2009 ◽  
Vol 1153 ◽  
Author(s):  
Andreas Bill ◽  
Anthony V Teran ◽  
Ralf B Bergmann

AbstractWe analyze the grain size distribution during solid phase crystallization of Silicon thin films. We use a model developed recently that offers analytical expressions for the time-evolution of the grain size distribution during crystallization of a d-dimensional solid. Contrary to the usual fit of the experimental results with a lognormal distribution, the theory describes the data from basic physical principles such as nucleation and growth processes. The theory allows for a good description of the grain size distribution except for early stages of crystallization. The latter case is expected and discussed. An important outcome of the model is that the distribution at full crystallization is determined by the time-dependence of the nucleation and growth rates of grains. In the case under consideration, the theory leads to an analytical expression that has the form of a lognormal-type distribution for the fully crystallized sample.

2011 ◽  
Vol 1308 ◽  
Author(s):  
Andreas Bill ◽  
Ralf B. Bergmann

ABSTRACTWe present an overview of the theory developed over the last few years to describe the crystallization of amorphous solids. The microstructure of the crystallizing solid is described in terms of the grain size distribution (GSD). We propose a partial differential equation that captures the physics of crystallization in random nucleation and growth processes. The analytic description is derived for isotropic and anisotropic growth rates and allows for the analysis of different stages of crystallization, from early to full crystallization. We show how the timedependence of effective nucleation and growth rates affect the final distribution. In particular, we demonstrate that for cases described by the Kolmogorov-Avrami-Mehl-Johnson (KAMJ) model applicable to a large class of crystallization processes a lognormal type distribution is obtained at full crystallization. The application of the theory to the crystallization of silicon thin films is discussed.


1997 ◽  
Vol 467 ◽  
Author(s):  
R. B. Bergmann ◽  
J. Krinke ◽  
H. P. Strunk ◽  
J. H. Werner

ABSTRACTWe deposit phosphorus-doped, amorphous Si by low pressure chemical vapor deposition and subsequently crystallize the films by furnace annealing at a temperature of 600°C. Optical in-situ monitoring allows one to control the crystallization process. Phosphorus doping leads to faster crystallization and a grain size enhancement with a maximum grain size of 15 μm. Using transmission electron microscopy we find a log-normal grain size distribution in our films. We demonstrate that this distribution not only arises from solid phase crystallization of amorphous Si but also from other crystallization processes based on random nucleation and growth. The log-normal grain size distribution seems to be a general feature of polycrystalline semiconductors.


1992 ◽  
Vol 283 ◽  
Author(s):  
T. Matsuyama ◽  
T. Baba ◽  
M. Tanaka ◽  
S. Tsuda ◽  
H. Nishiwaki ◽  
...  

ABSTRACTThe relationship between the grain size of poly-Si after SPC and the structure of a-Si before SPC was studied. The structure of a-Si was characterized by TA/TO: the Raman intensity ratio of the Transverse Acoustic (TA) like band and the Transverse Optical (TO) like band. A good positive correlation between the grain size and TS/TO was revealed for the first time. The nucleation and growth kinetics were speculated by using a thermodynamic model. The grain size could be enlarged up to 6 μ m by applying textured substrates to a-Si with a large structural disorder. This film was applied to the active layer of solar cells, and a collection efficiency of 51% at 900 nm was obtained.


2013 ◽  
Vol 33 (6) ◽  
pp. 1 ◽  
Author(s):  
Qunhui YANG ◽  
Mujun LI ◽  
Shengxiong YANG ◽  
Benduo ZHU ◽  
Fuwu JI ◽  
...  

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