Degradation of Current Gain for Ion Implanted 4H-SiC Bipolar Junction Transistor
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AbstractDegradation of current gain for ion implanted 4H-SiC bipolar junction transistor is described. The influence of bandgap-narrowing to the collector and base currents of the transistor was investigated using ISE-TCAD simulator. Simulated results show good agreement with the measured results, which show that the common emitter current gain of 3.9 is obtained at a maximum base concentration of 2×1017/cm3 and a maximum emitter concentration of 4×1019/cm3 for ion implanted 4H-SiC BJTs.
2010 ◽
Vol 645-648
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pp. 1065-1067
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2010 ◽
Vol 130
(12)
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pp. 2188-2191
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2009 ◽
Vol 615-617
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pp. 821-824
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2007 ◽
Vol 17
(10)
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pp. 3449-3453
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2005 ◽
Vol 483-485
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pp. 901-904
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2006 ◽
Vol 527-529
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pp. 1417-1420
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