Laser Surface Modification for Copper Deposition on Polyimide

1988 ◽  
Vol 129 ◽  
Author(s):  
Y.S. Liu ◽  
H.S. Cole

ABSTRACTSelective modification of surface reactivities with lasers, using either direct writing or projection method, is intrinsically a sensitive method to prepare a surface for highresolution and high-speed area selective thin film deposition. In this paper, we demonstrated the use of laser direct-writing and projection patterning techniques for selective modification of the electrochemical property of a polyimide surface. High quality and highresolution copper patterns on polyimide surfaces are produced when the surface-modified sample is subsequently placed in an electroless plating solution. These results demonstrated that the use of laser-selective-modification of surface properties in conjunction with other batch thin film deposition processes provides an attractive approach for area-selective metallization for a variety of applications in which high writing speed and high sensitivity are required.

Diamond-like carbon refers to forms of amorphous carbon and hydrogenated amorphous carbon containing a sizeable fraction of sp 3 bonding, which makes them mechanically hard, infrared transparent and chemically inert. This paper discusses the various thin film deposition processes used to form diamond-like carbon and the deposition mechanisms responsible for promoting the metastable sp 3 bonding.


Author(s):  
Andreas Pflug ◽  
Michael Siemers ◽  
Thomas Melzig ◽  
Martin Keunecke ◽  
Lothar Schäfer ◽  
...  

2020 ◽  
Vol 13 (10) ◽  
pp. 3459-3468 ◽  
Author(s):  
Sung Soo Shin ◽  
Jeong Hun Kim ◽  
Kyung Taek Bae ◽  
Kang-Taek Lee ◽  
Sang Moon Kim ◽  
...  

A multiscale architectured solid oxide fuel cell is demonstrated by applying a large-area ceramic micropatterning and thin-film deposition processes.


Author(s):  
Fredrick M. Mwema ◽  
Esther T. Akinlabi ◽  
Oluseyi Philip Oladijo

In this chapter, the current state of the art in optimization of thin film deposition processes is discussed. Based on the reliable and credible published results, the study aims to identify the applications of various optimization techniques in the thin film deposition processes, with emphasis on physical deposition methods. These methods are chosen due to their attractive attributes over chemical deposition techniques for thin film manufacturing. The study identifies the critical parameters and factors, which are significant in designing of the optimization algorithms based on the specific deposition methods. Based on the specific optimization studies, the chapter provides general trends, optimization evaluation criteria, and input-output parameter relationships on thin film deposition. Research gaps and directions for future studies on optimization of physical vapor deposition methods for thin film manufacturing are provided.


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