Beam Shaping for Cw Laser Recrystallization of Polysilicon Films

1982 ◽  
Vol 13 ◽  
Author(s):  
P. Zorabedian ◽  
C.I. Drowley ◽  
T.I. Kamins ◽  
T.R. Cass

ABSTRACTA shaped laser beam has been used for laterally seeded recrystallization of polysilicon films over oxide. Direct maps of the shaped-beam intensity distribution in the wafer plane are correlated with the grain structure of the recrystallized polysilicon. Using 60% overlapping of shaped-beam scans along <100> directions, we have obtained seeded areas one mm wide and 50 to 500μm long. These consist of 40μm-wide adjacent single-crystal strips regularly separated by low-angle grain boundaries extending laterally away from the seed openings. The spacing between grain boundaries is equal to the scan spacing, providing a means for controlling the location of grain boundaries in otherwise defect-free, single-crystal films.

1983 ◽  
Vol 23 ◽  
Author(s):  
Soi group

ABSTRACTFor the recrystallization of poly-Si films deposited on oxidized Si wafers, we focus our research on lamp and cw laser systems. We have obtained large single-crystal films using both techniques. “Selective annealing” allows localization of the remaining defects in the recrystallized films. Crystallographic as well as electrical characterization confirm the device-worthy potential of this material.


Author(s):  
L. E. Murr ◽  
G. Wong

Palladium single-crystal films have been prepared by Matthews in ultra-high vacuum by evaporation onto (001) NaCl substrates cleaved in-situ, and maintained at ∼ 350° C. Murr has also produced large-grained and single-crystal Pd films by high-rate evaporation onto (001) NaCl air-cleaved substrates at 350°C. In the present work, very large (∼ 3cm2), continuous single-crystal films of Pd have been prepared by flash evaporation onto air-cleaved (001) NaCl substrates at temperatures at or below 250°C. Evaporation rates estimated to be ≧ 2000 Å/sec, were obtained by effectively short-circuiting 1 mil tungsten evaporation boats in a self-regulating system which maintained an optimum load current of approximately 90 amperes; corresponding to a current density through the boat of ∼ 4 × 104 amperes/cm2.


1981 ◽  
Vol 4 ◽  
Author(s):  
T. J. Stultz ◽  
J. F. Gibbons

ABSTRACTStructural and electrical characterization of laser recrystallized LPCVD silicon films on amorphous substrates using a shaped cw laser beam have been performed. In comparing the results to data obtained using a circular beam, it was found that a significant increase in grain size can be achieved and that the surface morphology of the shaped beam recrystallized material was much smoother. It was also found that whereas circular beam recrystallized material has a random grain structure, shaped beam material is highly oriented with a <100> texture. Finally the electrical characteristics of the recrystallized film were very good when measured in directions parallel to the grain boundaries.


2001 ◽  
Vol 27 (6) ◽  
pp. 451-453 ◽  
Author(s):  
S. S. Kucherenko ◽  
V. P. Pashchenko ◽  
P. I. Polyakov ◽  
S. I. Khartsev ◽  
V. A. Shtaba

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