The Effect of Water Vapor and Oxygen in the Processing Environment on the Properties of Sputtered a-Si:H Films
Keyword(s):
ABSTRACTA systematic study of the effect of the trace impurity of oxygen and water vapor in the processing environment on the infra-red (IR), optical and electrical properties, and defect density of sputtered a-Si:H films is reported. The results are that small contents of water introduced into the argon plasma extract H-atoms from the growth surface, thereby reducing total hydrogen content and polyhydride formation in films deposited at low substrate temperatures, <150°C. This leads to a decrease of the defect density, and hence, to improvements in the photoconductivity (Δσ) and the associated quantum efficiency-mobility-lifetime(ημτ) product.
2021 ◽
Vol 2114
(1)
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pp. 012044
2015 ◽
Vol 86
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pp. 403-411
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2019 ◽
Vol 10
(2)
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pp. 138-150
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2015 ◽
Vol 230
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pp. 233-237
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2018 ◽
Vol 546
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pp. 28-32
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2003 ◽
Vol 14
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pp. 149-153