Thin Film Growth Using Low-Energy Multi-Ion Beam Deposition System
Keyword(s):
Ion Beam
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ABSTRACTA high-current, low-energy multi-ion beam deposition system has been developed for the fabrication of tailored new materials. This system consists of two ion sources, a dual-sector type mass analyzer and a deceleration system. Several ion species can be extracted successively from the two ion sources by switching the mass analyzer selection. Artificially structured materials, especially having a layered structure, can be grown by the fine control of the growth process of each layer. Ar* ion deceleration characteristics of this ion beam deposition system and preliminary results about the epitaxial growth of Ca film on Si(100) are shown.
1999 ◽
Vol 198-199
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pp. 731-733
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Development of a high energy large sheet ion beam system and a low energy ion beam deposition system
1994 ◽
pp. 63-68
Keyword(s):
Ion Beam
◽