Ion Beam Induced Crystallization of Amorphous Si from NiSi2 Precipitates: An In Situ Study
Keyword(s):
Ion Beam
◽
ABSTRACTBy first growing NiSi2 precipitates in a-Si and then irradiating with a 150 keV Si beam, we have studied ion beam induced epitaxial crystallization (IBIEC) of Si initiated at a-Si/NiSi2 precipitate interfaces. The growth shape and its temperature dependence are studied in-beam via in situ transmission electron microscopy. Interface roughening is evidenced. Preliminary results for the Co-Si system are also reported.
2007 ◽
Vol 90
(11)
◽
pp. 3651-3655
◽
2015 ◽
Vol 27
(23)
◽
pp. 8146-8152
◽
2016 ◽
Vol 22
(6)
◽
pp. 1350-1359
◽
2009 ◽
Vol 24
(11)
◽
pp. 3294-3299
◽