Superhard Nanocomposite of Nitride Superlattices by Opposed-Cathode Unbalanced Magnetron Sputtering

1992 ◽  
Vol 286 ◽  
Author(s):  
X. Chu ◽  
M. S. Wong ◽  
W. D. Sproul ◽  
S. A. Barnett
Keyword(s):  
Magnetron Sputtering ◽  
Film Growth ◽  
Thin Layers ◽  
High Rate ◽  
Nanocomposite Films ◽  
Individual Layer ◽  
Substrate Bias Voltage ◽  
Unbalanced Magnetron Sputtering ◽  
Unbalanced Magnetron ◽  
Nitride Superlattices

ABSTRACTNanocomposite films of polycrystalline nitride superlattices with nanometer grain size were deposited onto tool steel substrates by a one-step process using an opposed-cathode high-rate reactive unbalanced magnetron sputtering system. The superlattices are composed of alternating thin layers of different nitrides such as TiN/NbN and TiN/VN. The thicknesses of two neighboring layers were between 3 and 150 nm and were determined by the rotating speed of the substrate holder and the sputtering rate of the individual layer material. The films exhibited exceptional hardness as high as 5200 kgf/mm2 for TiN/NbN superlattice and 5 100 kgf/mm2 for TiN/VN superlattice. The hardnesses of the superlattice coatings were strongly dependent on several deposition parameters such as the superlattice period, the nitrogen partial pressure, and the substrate bias voltage. One of the possible mechanisms for the hardness enhancement is the effect of nanophase materials, which were created mainly by the influence of the artificially layered-structure and the low energy ion bombardment during film growth.

High rate reactive sputtering in an opposed cathode closed-field unbalanced magnetron sputtering system

1990 ◽  
Vol 43-44 ◽  
pp. 270-278 ◽  
Author(s):  
William D. Sproul ◽  
Paul J. Rudnik ◽  
Michael E. Graham ◽  
Suzanne L. Rohde
Keyword(s):  
Magnetron Sputtering ◽  
Reactive Sputtering ◽  
High Rate ◽  
Closed Field ◽  
Unbalanced Magnetron Sputtering ◽  
Unbalanced Magnetron ◽  
Sputtering System

Preparation and properties of Ag/DLC nanocomposite films fabricated by unbalanced magnetron sputtering

2013 ◽  
Vol 284 ◽  
pp. 165-170 ◽  
Author(s):  
Yanxia Wu ◽  
Jianmin Chen ◽  
Hongxuan Li ◽  
Li Ji ◽  
Yinping Ye ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Nanocomposite Films ◽  
Unbalanced Magnetron Sputtering ◽  
Unbalanced Magnetron

Influence of the Substrate Bias Voltage on the Structure of Rutile TiO2 Films Prepared by Dual Cathode DC Unbalanced Magnetron Sputtering

2012 ◽  
Vol 506 ◽  
pp. 82-85
Author(s):  
P. Kasemanankul ◽  
N. Witit-Anun ◽  
S. Chaiyakun ◽  
P. Limsuwan
Keyword(s):  
Crystal Structure ◽  
Magnetron Sputtering ◽  
Grazing Incidence ◽  
Substrate Bias ◽  
Substrate Bias Voltage ◽  
Force Microscopy ◽  
Unbalanced Magnetron Sputtering ◽  
Unbalanced Magnetron ◽  
Xrd Patterns ◽  
Deposited Films

Rutile TiO2 films are normally used as biomaterial that synthesized on unheated stainless steel type 316L and glass slide substrates by dual cathode DC unbalanced magnetron sputtering. The influence of the substrate bias voltages (Vsb), from 0 V to-150V, on the structure of the as-deposited films was investigated. The crystal structure was characterized by grazing-incidence X-ray diffraction (GIXRD) technique, the films thickness and surface morphology was evaluated by atomic force microscopy (AFM) technique, respectively. The results show that the as-deposited films were transparent and have high transmittance in visible regions. The crystal structure of as-deposited films show the XRD patterns of rutile (110) with Vsb at 0V and shifted to rutile (101) with increasing Vsb. The films roughness (Rrms) and the thickness were 3.0 nm to 5.7 nm and 420 nm to 442 nm, respectively.

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