Pt Hillock Formation and Decay

1994 ◽  
Vol 361 ◽  
Author(s):  
Scott R. Summerfelt ◽  
Dave Kotecki ◽  
Angus Kingon ◽  
H.N. Al-Shareef
Keyword(s):  
Surface Roughness ◽  
Electron Beam Evaporation ◽  
Dielectric Thickness ◽  
Force Microscopy ◽  
Si Substrates ◽  
Atomic Force ◽  
Hillock Formation ◽  
Roughness Analysis ◽  
High Dielectric

ABSTRACTThe formation of Pt hillocks during high temperature processing is a problem when using Pt as a bottom electrode for high dielectric constant materials. The hillock height is frequently larger than the dielectric thickness, degrading the leakage current of the device. In this work, Pt was deposited by electron beam evaporation on in-situ formed 40 nm ZrO2 coated SiO2 / Si substrates. The samples were then annealed at temperatures between 400°C and 700°C for times ranging from 2 min to 40 min. The surface roughness was measured by atomic force microscopy (AFM). The surface was characterized using Ra, RMS and Zmax over 5 μm × 5μm regions. Zmax is sensitive to hillock formation and Ra is sensitive to changes in general surface roughness. Analysis of Zmax indicates that 100 nm Pt / ZrO2 deposited at 315°C forms hillocks above 450°C during initial heatup. Subsequently, the hillocks decay for temperatures of 600°C and above such that they are almost gone after a 30 min air anneal. In-situ wafer stress measurements of Pt / ZrO2 were performed in O2 at temperatures up to 650°C. The Pt relaxes above 500°C in O2.

Afm Studies of Surface Roughness of Borophosphosilicate Glass (BPSG) Films and Their Impact on Defect Detection Capability for Sub Micron Vlsi Technology

1992 ◽  
Vol 280 ◽  
Author(s):  
H. Rojhantalab ◽  
M. Moinpour ◽  
N. Peter ◽  
M.L.A. Dass ◽  
W. Hough ◽  
...  
Keyword(s):  
Surface Roughness ◽  
Defect Detection ◽  
Device Fabrication ◽  
Interlayer Dielectric ◽  
Force Microscopy ◽  
Si Substrates ◽  
Atomic Force ◽  
Vlsi Technology ◽  
Borophosphosilicate Glass

ABSTRACTChemically vapor deposited borophosphosilicate glass (BPSG) has been widely used in microelectronic device fabrication as interlayer dielectric film due to its excellent planarization, gettering and flow properties. With device geometry reducing to sub micron levels, there is an increasingly greater emphasis on detection and elimination of sub micron defects particularly on deposited film. In this paper, we report on the evaluation and characterization of the surface roughness of BPSG films of various thicknesses and film compositions deposited on Si substrates using the Atomic Force Microscopy (AFM). The effects of high temperature densification process on the surface roughness are presented. The defect detection capabilities of conventional laser-based particle counters with respect to the surface roughness of BPSG films are investigated.

Growth of (0001) ZnO Thin Films on Sapphire

1996 ◽  
Vol 449 ◽  
Author(s):  
A. J. Drehman ◽  
P. W. Yip
Keyword(s):  
Surface Roughness ◽  
Buffer Layers ◽  
Zno Films ◽  
X Ray Diffraction ◽  
Axis Orientation ◽  
Force Microscopy ◽  
Sapphire Substrates ◽  
Atomic Force

ABSTRACTUsing reactive rf sputtering, we have grown (0001) oriented ZnO films in situ on heated c-axis sapphire substrates, that are promising, particularly in terms of surface roughness, as buffer layers for the subsequent epitaxial growth of III-V nitride films. We compare the effects of on-axis and off-axis sputter geometries on the film epitaxy and smoothness. We also examined the effect of substrate temperature on the growth and smoothness and quality of the film. X-ray diffraction was used to verify the hexagonal ZnO phase, its c-axis orientation and, qualitatively, the degree of its epitaxy. Atomic Force Microscopy (AFM) was used to determine the ZnO growth morphology and roughness. Our best films, obtained by off-axis sputter deposition, have a surface roughness of less than 1 nm.

scholarly journals In Situ AFM Imaging of Adsorption Kinetics of DPPG Liposomes: A Quantitative Analysis of Surface Roughness

2019 ◽  
Vol 25 (3) ◽  
pp. 798-809
Author(s):  
Andreia A. Duarte ◽  
Joaquim T. Marquês ◽  
Francisco Brasil ◽  
Ana S. Viana ◽  
Pedro Tavares ◽  
...  
Keyword(s):  
Surface Roughness ◽  
Hydrodynamic Diameter ◽  
Supported Lipid Bilayer ◽  
Force Microscopy ◽  
Atomic Force ◽  
Power Spectral ◽  
Afm Imaging ◽  
Density Analysis ◽  
Power Spectral Density Analysis

AbstractThe adsorption of intact liposomes on surfaces is of great importance for the development of sensors and drug delivery systems and, also, strongly dependent on the surface roughness where the liposomes are adsorbed. In this paper, we analyzed, by using atomic force microscopy in liquid, the evolution of the morphology of gold surfaces and of poly(allylamine hydrochloride) (PAH) surfaces with different roughness during the adsorption of liposomes prepared with the synthetic phospholipid 1,2-dipalmitoyl-sn-glycero-3-[phospho-rac-(1-glycerol)]. Our results reveal the following. On smooth surfaces of Au only and Au with PAH, the liposomes open and deploy on the substrate, creating a supported-lipid bilayer, with the opening process being faster on the Au/PAH surface. On rough substrates of Au coated with polyelectrolyte multilayers, the liposomes were adsorbed intact on the surface. This was corroborated by power spectral density analysis that demonstrates the presence of superstructures with an average lateral size of 43 and 87 nm, in accordance with two and four times the mean liposome hydrodynamic diameter of about 21 nm. In addition, this work presents an adequate and effective methodology for analysis of adsorption phenomena of liposomes on rough surfaces.

Growth and Structure of Metallic Barrie Laye and Interconnect Films I: Exeriments

1999 ◽  
Vol 564 ◽  
Author(s):  
D. L. Windt ◽  
J. Dalla Torre ◽  
G. H. Gilmer ◽  
J. Sapjeta ◽  
R. Kalyanaraman ◽  
...  
Keyword(s):  
Surface Roughness ◽  
Orientation Angle ◽  
Film Surface ◽  
Growth Direction ◽  
Film Structure ◽  
Argon Pressure ◽  
Cu Films ◽  
Force Microscopy ◽  
Si Substrates ◽  
Atomic Force

AbstractWe present experimental results directed at understanding the growth and structure of metallic barrier layer and interconnect films. Numerical simulation results associated with this experimental work are presented in an accompanying paper in these proceedings. Here, thin films of Al, Ti, Cu and Ta have been grown by magnetron sputtering onto oxidized Si substrates. Using a specially-constructed substrate holder, the orientation of the substrate with respect to the growth direction was varied from horizontal to vertical. Films were grown at both low and high argon pressure; in the case of Ta, the cathode power was varied as well. The film structure and in particular the surface roughness was measured by X-ray reflectance and also by atomic force microscopy. We find that the surface roughness increases markedly with orientation angle in the case of Ta and Cu films, and in Ti films grown at high argon pressure. At low pressure, however, the Ti film surface roughness remains constant for all substrate orientations. No variation in roughness with either orientation angle or argon pressure was observed in the Al films. These results suggest that, under certain circumstances, shadowing effects and/or grain orientation (i.e., texture) competition during growth can give rise to lower density, more porous (and thus more rough) films, particularly at large orientation angles, as on sidewalls in sub-micron trenches.

MICROSTRUCTURE EVOLUTION OF GOLD ATOMIC AGGREGATES FABRICATED ON SILICONE OIL SURFACE

2015 ◽  
Vol 22 (05) ◽  
pp. 1550066 ◽  
Author(s):  
YUANXIN FENG ◽  
CHUHANG ZHANG
Keyword(s):  
Surface Roughness ◽  
Microstructure Evolution ◽  
Au Nanoparticles ◽  
Silicone Oil ◽  
Force Microscopy ◽  
Atomic Force ◽  
Roughness Analysis ◽  
Shadowing Effect ◽  
The Mean ◽  
Afm Observation

Gold atomic aggregates are fabricated by vapor-depositing Au atoms onto a silicone oil surface and the microstructure evolution is investigated by atomic force microscopy (AFM) observation. It is found that the Au aggregates are composed of Au circular nanoparticles with diameter around 45 nm, which is independent with the nominal film thickness d. As d increases from 1 nm to 15 nm, the height of the nanoparticles increases from 15 nm to 25 nm, indicating the geometric shape of the Au nanoparticles evolves from plateau to spherical. Furthermore, the roughness analysis shows that the mean surface roughness increases linearly with d in the range of 1 nm–15 nm, which is quite different from the findings in Ag system. The anomalous microstructure evolution of Au aggregates suggests that the growth of Au aggregates may be dominated by the shadowing effect.

Investigating the Effect of Process Parameters in Incremental Sheet Forming Process

2021 ◽  
pp. 24-36
Author(s):  
Manish Oraon ◽  
Manish Kumar Roy ◽  
Vinay Sharma
Keyword(s):  
Surface Roughness ◽  
Process Parameters ◽  
Sheet Forming ◽  
Incremental Sheet Forming ◽  
Forming Process ◽  
Batch Production ◽  
Force Microscopy ◽  
Atomic Force ◽  
Roughness Analysis ◽  
Step Down

Incremental sheet forming (ISF) is an emerging technique of sheet metal working that comes into the picture in the last two decades. The ISF involved the forming of shapes without using the dedicated dies. ISF is suitable for customized products, rapid prototyping, and low batch production. The study aims to investigate the effect of process parameters on the surface roughness. The experiments are conducted on aluminum AA3003-O grade with six parameters, and the trials are performed according to the design of experiment (DOE). The atomic force microscopy (AFM) technique is used for measuring the surface roughness. Analysis of variance (ANOVA) is used for analyzing the effect of process parameters in ISF. The result shows that the step-down size, feed rate of the tool, and wall angle are significant process parameter and their contributions for ISF are 85.86%, 1.12%, and 12.29%, respectively.

Measuring Thickness Changes in Thin Films Due to Chemical Reaction by Monitoring the Surface Roughness with In Situ Atomic Force Microscopy

2002 ◽  
Vol 8 (5) ◽  
pp. 422-428 ◽  
Author(s):  
L.Y. Beaulieu ◽  
A.D. Rutenberg ◽  
J.R. Dahn
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Surface Roughness ◽  
Atomic Force Microscopy ◽  
Alloy Film ◽  
Force Microscopy ◽  
Atomic Force ◽  
Direct Proportionality ◽  
Roughness Measurements

Measuring the changing thickness of a thin film, without a reference, using an atomic force microscope (AFM) is problematic. Here, we report a method for measuring film thickness based on in situ monitoring of surface roughness of films as their thickness changes. For example, in situ AFM roughness measurements have been performed on alloy film electrodes on rigid substrates as they react with lithium electrochemically. The addition (or removal) of lithium to (or from) the alloy causes the latter to expand (or contract) reversibly in the direction perpendicular to the substrate and, in principle, the change in the overall height of these materials is directly proportional to the change in roughness. If the substrate on which the film is deposited is not perfectly smooth, a correction to the direct proportionality is needed and this is also discussed.

Coloration of bacterial cellulose using in situ and ex situ methods

2018 ◽  
Vol 89 (7) ◽  
pp. 1297-1310 ◽  
Author(s):  
Euijin Shim ◽  
Hye Rim Kim
Keyword(s):  
Surface Roughness ◽  
Bacterial Cellulose ◽  
Carbon Sources ◽  
Production Yield ◽  
Ex Situ ◽  
Surface Appearance ◽  
Force Microscopy ◽  
Atomic Force ◽  
In Situ Method

This study aimed to produce colored bacterial cellulose (BC) by adding dye during cultivation (in situ) and by dyeing BC after cultivation (ex situ), respectively. Three different dyestuffs—direct, acid and reactive—were selected for application in the coloring of BC. In the in situ method, the dyestuff is adding into the culture medium. The effects of various dyestuff and carbon sources on the production yield were evaluated. In the ex situ method, the dyestuff, BC gel, was dyed under various dyestuff and dyeing conditions. The production yield of BC cultured by the in situ method in glucose as the carbon source and using a reactive dyestuff was the highest, at about 86%. The ex situ dyeability of BC was improved by setting the dyeing conditions to pH 3 and 135℃. Both methods were evaluated regarding the surface appearance of the BC by scanning electron microscopy (SEM). The SEM showed that the defined cellulose fibril networks retained their inherent nanostructures when the dye penetrated the site through dyeing. The surface roughness of the BC, colored by the two methods, was evaluated by atomic force microscopy. The BC colored by both methods showed smooth surfaces. For BC colored by the in situ method, the surface roughness was 194 nm, indicating that the BC was smoother and finer than that obtained via the ex situ method. In comparing hue and saturation values, the BC colored by the in situ method showed clearer blue colors than that colored by the ex situ method. The in situ method was more effective than the ex situ method for coloring BC.

scholarly journals Relationship between the properties of an interlayer formed by in situ Ti anodization and anaphoretically deposited hydroxyapatite

2019 ◽  
Vol 84 (11) ◽  
pp. 1305-1318 ◽  
Author(s):  
Marijana Pantovic-Pavlovic ◽  
Miroslav Pavlovic ◽  
Sanja Erakovic ◽  
Tanja Barudzija ◽  
Jasmina Stevanovic ◽  
...  
Keyword(s):  
Surface Roughness ◽  
Composite Coatings ◽  
Substrate Surface ◽  
Titanium Substrate ◽  
Cell Voltage ◽  
The Novel ◽  
Force Microscopy ◽  
Atomic Force ◽  
Coating Synthesis

The optimization of the anodization process of Ti substrate for in situ synthesis of hydroxyapatite/titanium oxide composite coatings on titanium substrate was accomplished. The anodization was performed under 30, 60 and 90 V cell voltage, and the morphology of treated surface, as well as linear and surface roughness, were analysed by field emission-scanning electron microscopy, atomic force microscopy and roughness tester. It was shown by linear and surface roughness analyses that titanium anodized under 60 V has the highest roughness, whereas at 90 V the flattening of the surface occurs. As the highest surface roughness results emerged at 60 V, the novel process of composite anHAp/TiO2 coating synthesis, which comprises simultaneous processes of TiO2 formation and HAp deposition, as well as HAp impregnation within TiO2 surface layer, was performed at this voltage. Ti substrate surface was completely covered by composite coating, with no visible cracks. The adhesion quantified according to ASTM D3359-02 standard is considerably improved with respect to the coatings obtained by cathaphoretic processes, with no need of subsequent sintering.

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