Large Area Uniform Deposition of YBa2Cu3O7 Thin Films by a 90° Off-axis Sputtering Technique
Keyword(s):
AbstractLarge area uniform deposition of Yba2Cu3O7 (YBCO) thin films on 8 inch diameter wafers, using a 3 inch diameter sputtering target and optimized substrate rotation in a single target 90° off-axis sputtering technique, is reported. The variation in thickness, composition and superconducting properties was studied as a function of substrate position on stationary and rotating substrates. The films deposited from a 3” target on rotating substrates displayed uniform thickness (< ±5% variation) and composition (< 2.3% deviation from target stoichiometry) and a consistently high transition temperature ( Tc > 88.3°K) over an 8” diameter area.
2004 ◽
Vol 22
(4)
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pp. 1134-1138
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2012 ◽
Vol 15
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pp. 170-178
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1995 ◽
Vol 05
(C8)
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pp. C8-783-C8-787
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2017 ◽
Vol 2017
(DPC)
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pp. 1-25
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1974 ◽
Vol 13
(S1)
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pp. 471
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