Characterization of Ruo2 Films Prepared by Rf Reactive Magnetron Sputtering

1998 ◽  
Vol 541 ◽  
Author(s):  
Li-jian Meng ◽  
M.P. dos Santos
Keyword(s):  
Magnetron Sputtering ◽  
Oxygen Partial Pressure ◽  
Partial Pressure ◽  
Total Pressure ◽  
High Stress ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
Low Oxygen ◽  
X Ray Diffraction ◽  
Partial Pressures

AbstractRuthenium dioxide films have been prepared by rf reactive magnetron sputtering at different oxygen partial pressures and total sputtering pressures. The films have been characterized by scanning electron microscopy, X-ray diffraction and electrical conductivity. The films prepared at low oxygen partial pressure and total pressure show a strong preferred orientation along the [110] direction. As both pressures increased, the peak intensity decreases. All the films are subject to a compressive stress. As the total pressure is decreased and the oxygen partial pressure is increased, the stress increases. When the total pressure is lower than 6 × 10−3 mbar and the oxygen partial pressure is higher than 1 × 103 mbar, the films peeled off automatically from the substrate because of the high stress. The films prepared at high oxygen partial pressure and high total pressure have a rough surface and those prepared at low pressure show smooth surface. In this paper, these phenomena have been discussed. In addition, the electrical properties of the films are also discussed.

Improving the Bonding Strength of Y2O3 Coatings on Steel Substrates through a YOX Adhesion Layer

2011 ◽  
Vol 686 ◽  
pp. 637-640 ◽  
Author(s):  
Wei Ling Lv ◽  
Jun Liu ◽  
Tao Tang ◽  
Ling Yang ◽  
Rong Lei ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Oxygen Partial Pressure ◽  
Partial Pressure ◽  
Bonding Strength ◽  
Composite Coatings ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
X Ray Diffraction ◽  
Partial Pressures ◽  
Steel Substrates

Y2O3/YOx composite coatings with different YOx adhesion layers were fabricated on 316L stainless steel substrates through reactive magnetron sputtering. The YOx adhesion layers were deposited by radio frequency reactive magnetron sputtering with different oxygen partial pressures at a total pressure of 1.2 Pa. The Y2O3 coatings were deposited by bipolar pulse reactive magnetron sputtering. The relationships between the microstructures, phase compositions, interfacial adhesion of the composite coatings and the oxygen partial pressure used for deposition of the YOx adhesion layers were investigated. The microstructures and phase compositions of the coatings were characterized by scanning electronic microscopy and X-ray diffraction. The bonding strength of the coatings was measured by scratch tester. The results showed that the bonding strength of the Y2O3/YOx composite coatings reached the maximum value when the oxygen partial pressure was 0.18 Pa.

Deposition of Microcrystalline Si,Ge (µc-Si,Ge) Alloys by Reactive Magnetron Sputtering

1994 ◽  
Vol 358 ◽  
Author(s):  
S.M. Cho ◽  
D. Wolfe ◽  
S.S. He ◽  
K. Christensen ◽  
D.M. Maher ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Partial Pressure ◽  
Microstructural Characterization ◽  
High Energy ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
X Ray Diffraction ◽  
Film Properties ◽  
Transmission Electron ◽  
Partial Pressures

ABSTRACTSixGei1−x:H alloys which span the transition from amorphous to microcrystalline structures have been prepared by reactive magnetron sputtering (RMS) from pure crystalline Si and Ge targets in different partial pressures of hydrogen, using argon as the sputtering gas. Film properties were studied as a function of H2 flow and partial pressure. X-ray diffraction (XRD), Raman scattering, Fourier transform infrared spectroscopy (FTIR), reflection high-energy electron diffraction (RHEED), and high resolution transmission electron microscopy (HRTEM) have been used for microstructural characterization. Films prepared by RMS at a partial pressure of hydrogen (PH2) < ∼ 4 mTorr were amorphous, while those prepared with PH2 > ∼ 6 mTorr were microcrystalline.

Tensile Properties and Creep Behavior of SiC-Based Fibers under Various Oxygen Partial Pressures

2005 ◽  
Vol 475-479 ◽  
pp. 1333-1336 ◽  
Author(s):  
Jan Ji Sha ◽  
J.S. Park ◽  
Tatsuya Hinoki ◽  
Akira Kohyama ◽  
J. Yu
Keyword(s):  
Oxygen Partial Pressure ◽  
Partial Pressure ◽  
Tensile Properties ◽  
Creep Behavior ◽  
Elevated Temperatures ◽  
Low Oxygen ◽  
X Ray Diffraction ◽  
Sic Fibers ◽  
Partial Pressures ◽  
Ar Gas

Three kinds of atmospheres (air, highly-pure Ar and ultra highly-pure Ar gas) with different oxygen partial pressures were applied to investigate the tensile properties and creep behavior of SiC fibers such as Hi-NicalonTM and TyrannoTM-SA. These fibers were annealed and crept at elevated temperatures ranging from1273-1773 K in such environments. After annealing at 1773 K, the room temperature tensile strengths of SiC-based fibers decreased with decreasing the oxygen partial pressure and the near stoichiometric fiber TyrannoTM-SA shows excellent strength retention. At temperatures above the 1573 K, the creep resistance of SiC fibers evaluated by bending stress relaxation (BSR) method under high oxygen partial pressure was lower than that of in low oxygen partial pressure. The microstructural features on these fibers were examined by scanning electron microscopy (SEM) and X-ray diffraction (XRD).

The Influence of Total and Oxygen Partial Pressures on Structure and Hydrophilic Property of TiO2 Thin Films Deposited by Reactive DC Magnetron Sputtering

2008 ◽  
Vol 55-57 ◽  
pp. 465-468 ◽  
Author(s):  
Surasing Chaiyakun ◽  
A. Buranawong ◽  
T. Deelert ◽  
N. Witit-Anun
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Oxygen Partial Pressure ◽  
Partial Pressure ◽  
Total Pressure ◽  
Dc Magnetron Sputtering ◽  
Tio2 Thin Films ◽  
Rutile Structure ◽  
Hydrophilic Property ◽  
Partial Pressures

TiO2 thin films have been deposited by reactive DC magnetron sputtering technique to study the effect of total pressure and oxygen partial pressure on structure and hydrophilic properties. The crystal structure and hydrophilic property was measured by XRD and contact angle meter, respectively. The results showed that the films were composed of pure rutile and mixed of anatase/rutile structure dependent on the total pressure and oxygen partial pressure. It was found that all films can perform hydrophilic property. In case of high total pressure, the films showed superhydrophilic property, whereas the films deposited under various oxygen partial pressures with fixed total pressure were all films exhibit superhydrophilic property.

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