Photoluminescence and Raman Spectroscopy Studies of H+ Ion Implanted SOI Structures Formed by Hydrogen Ion Slicing

2001 ◽  
Vol 667 ◽  
Author(s):  
Vladimir P. Popov ◽  
Ida E. Tyschenko ◽  
Konstantin S. Zhuravlev ◽  
Ivan I. Morosov

ABSTRACTH+ ion implanted SOI structures formed by hydrogen ion slicing have been investigated by Raman spectroscopy and photoluminescence (PL). After implantation the wafers have been heat-treated by either furnace annealing (FA) or rapid thermal annealing (RTA). It has been found that implantation of 3 × 1017 H+/cm2 results in the formation of the amorphous Si layer (a-Si) inside silicon film on insulator. Structural transformations in a-Si depended on the annealing conditions. FA led to crystallization of a-Si and to the formation of monocrystalline silicon films. RTA results in the formation of the layers containing a high density of Si nanocrystals. A comparison of the Raman measurements with the PL data allows to conclude that PL bands obtained near 420 and 500 nm are not associated with the radiative recombination in Si nanocrystals.

1991 ◽  
Vol 70 (6) ◽  
pp. 3088-3092 ◽  
Author(s):  
Sunil Kumar ◽  
H. J. Trodahl

2000 ◽  
Vol 638 ◽  
Author(s):  
G. F. Grom ◽  
P. M. Fauchet ◽  
L. Tsybeskov ◽  
J. P. McCaffrey ◽  
H. J. Labbé ◽  
...  

AbstractWe use Raman spectroscopy to study the size, shape and crystallographic orientation of silicon nanocrystals formed by solid phase crystallization of amorphous Si/SiO2 superlattices (SLs) grown by radio-frequency sputtering. The first and second Raman peaks broadening, their relative positions and intensities indicate the presence of nanoscale Si objects with a degree of disorder (grain boundaries) and strain (Si/SiO2 interfaces). Shapes of Si nanocrystals sandwiched between SiO2 layers strongly influence the Si/SiO2 interface roughness, which is inferred from the intensities of folded acoustic phonon scattering. The averaged crystallographic orientation of Si nanocrystals is determined by polarized Raman analysis. The laterally elongated nanocrystals exhibit <111> preferred crystallographic orientation along the SL axis due to orientation-dependent crystallization rates. These results demonstrate that control over Si nanocrystals structural parameters has been achieved and that solid phase crystallization of nanometer-thick amorphous Si films remains one of the most promising techniques for Si-based nanoelectronic device fabrication.


2020 ◽  
Vol 20 (10) ◽  
pp. 6604-6609
Author(s):  
Shanshan Liu ◽  
Guochun Zhang ◽  
Kai Feng ◽  
Yanyang Han ◽  
Tao He ◽  
...  

2010 ◽  
Vol 42 (6) ◽  
pp. 1820-1823 ◽  
Author(s):  
V.A. Volodin ◽  
T.T. Korchagina ◽  
J. Koch ◽  
B.N. Chichkov

1999 ◽  
Vol 28 (3) ◽  
pp. 319-324 ◽  
Author(s):  
R. D. Dupuis ◽  
C. J. Eiting ◽  
P. A. Grudowski ◽  
H. Hsia ◽  
Z. Tang ◽  
...  

2005 ◽  
Vol 351 (10-11) ◽  
pp. 833-837 ◽  
Author(s):  
N. Jaba ◽  
A. Mermet ◽  
E. Duval ◽  
B. Champagnon

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