A Novel AFM Chip for Fountain Pen Nanolithography - Design and Microfabrication

2003 ◽  
Vol 782 ◽  
Author(s):  
Keun-Ho Kim ◽  
Nicolaie Moldovan ◽  
Changhong Ke ◽  
Horacio D. Espinosa
Keyword(s):  
Thin Films ◽  
Atomic Force Microscopy ◽  
Fluid Flow ◽  
Numerical Simulations ◽  
Gold Substrate ◽  
Force Microscopy ◽  
Atomic Force ◽  
Air Interface ◽  
Flow Through ◽  
Afm Probe

ABSTRACTA novel atomic force microscopy (AFM) probe has been developed to expand the capability and applications of dip-pen nanolithography (DPN) technology. This new probe has integrated microchannels and reservoirs for continuous ink feed, which allow “fountain-pen” writing called “Fountain Pen Nanolithography” (FPN). Ink is transported from the reservoirs through the microchannels and eventually dispensed onto substrates via a volcano-like dispensing tip. Numerical simulations have been performed to select optimal materials and suitable tip shapes providing a stable fluid-air interface in the tip. Microchannel and dispensing tip have been fabricated by surface micromachining, in particular employing 3 layers of thin films. Fluid flow through the microchannels has been experimentally examined. The probe was used to write on a gold substrate.

The Study of Nanolithography Processing on the Photoresistor Thin Film by Atomic Force Microscopy

2014 ◽  
Vol 997 ◽  
pp. 379-382
Author(s):  
Jen Ching Huang ◽  
Fu Jen Cheng
Keyword(s):  
Thin Films ◽  
Atomic Force Microscopy ◽  
Groove Depth ◽  
Cutting Depth ◽  
Contact Mode ◽  
Force Microscopy ◽  
Atomic Force ◽  
On Line ◽  
Afm Probe ◽  
Mode Atomic Force Microscopy

In this paper, the nanomachining experiments on the SPR3001 photoresistor thin films were processing by contact mode atomic force microscopy (AFM). After the experiment, it can be found, in the nanomachining, the greater the indented distance along the Z-axis depth, carved out of the groove depth and groove width of nanoline is greater. The influences of cutting directions on line width and cutting depth during nanomachining were quite a few and the cutting situation was stable by lateral nanomachining. This article also successfully processed the regular hexagonal nanopattern, also proves the nanomachining ability of the AFM probe is good at nanoscale patterned on photoresistor thin films.

Atomic force microscopy of in situ deformed nickel thin films

1999 ◽  
Vol 353 (1-2) ◽  
pp. 194-200 ◽  
Author(s):  
C. Coupeau ◽  
J.F. Naud ◽  
F. Cleymand ◽  
P. Goudeau ◽  
J. Grilhé
Keyword(s):  
Thin Films ◽  
Atomic Force Microscopy ◽  
Force Microscopy ◽  
Nickel Thin Films ◽  
Atomic Force

Nanocrystalline Solutions as Precursors to The Spray Deposition of Cdte Thin Films

1995 ◽  
Vol 382 ◽  
Author(s):  
Martin Pehnt ◽  
Douglas L. Schulz ◽  
Calvin J. Curtis ◽  
Helio R. Moutinho ◽  
Amy Swartzlander ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Force Microscopy ◽  
Grain Size ◽  
X Ray Diffraction ◽  
X Ray ◽  
Force Microscopy ◽  
Cdte Nanoparticles ◽  
Atomic Force ◽  
Vis Spectroscopy ◽  
Cdte Thin Films

ABSTRACTIn this article we report the first nanoparticle-derived route to smooth, dense, phase-pure CdTe thin films. Capped CdTe nanoparticles were prepared by injection of a mixture of Cd(CH3)2, (n-C8H17)3 PTe and (n-C8H17)3P into (n-C8H17)3PO at elevated temperatures. The resultant nanoparticles 32-45 Å in diameter were characterized by x-ray diffraction, UV-Vis spectroscopy, transmission electron microscopy, thermogravimetric analysis and energy dispersive x-ray spectroscopy. CdTe thin film deposition was accomplished by dissolving CdTe nanoparticles in butanol and then spraying the solution onto SnO2-coated glass substrates at variable susceptor temperatures. Smooth and dense CdTe thin films were obtained using growth temperatures approximately 200 °C less than conventional spray pyrolysis approaches. CdTe films were characterized by x-ray diffraction, UV-Vis spectroscopy, atomic force microscopy, and Auger electron spectroscopy. An increase in crystallinity and average grain size as determined by x-ray diffraction was noted as growth temperature was increased from 240 to 300 °C. This temperature dependence of film grain size was further confirmed by atomic force microscopy with no remnant nanocrystalline morphological features detected. UV-Vis characterization of the CdTe thin films revealed a gradual decrease of the band gap (i.e., elimination of nanocrystalline CdTe phase) as the growth temperature was increased with bulk CdTe optical properties observed for films grown at 300 °C.

Scanning Tunneling Microscopy and Atomic Force Microscopy Investigation of Organic Tetracyanoquinodimethane Thin Films

1997 ◽  
Vol 12 (8) ◽  
pp. 1942-1945 ◽  
Author(s):  
H. J. Gao ◽  
H. X. Zhang ◽  
Z. Q. Xue ◽  
S. J. Pang
Keyword(s):  
Thin Films ◽  
Atomic Force Microscopy ◽  
Scanning Tunneling Microscopy ◽  
Pyrolytic Graphite ◽  
Film Surface ◽  
Scanning Tunneling ◽  
Tunneling Microscopy ◽  
Force Microscopy ◽  
Atomic Force ◽  
Microscopy Investigation

Scanning tunneling microscopy (STM) and atomic force microscopy (AFM) investigation of tetracyanoquinodimethane (TCNQ) and the related C60-TCNQ thin films is presented. Periodic molecular chains of the TCNQ on highly oriented pyrolytic graphite (HOPG) substrates were imaged, which demonstrated that the crystalline (001) plane was parallel to the substrate. For the C60-TCNQ thin films, we found that there were grains on the film surface. STM images within the grain revealed that the well-ordered rows and terraces, and the parallel rows in different grains were generally not in the same orientation. Moreover, the grain boundary was also observed. In addition, AFM was employed to modify the organic TCNQ film surface for the application of this type of materials to information recording and storage at the nanometer scale. The nanometer holes were successfully created on the TCNQ thin film by the AFM.

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