Microstructured Optical Fibers as New Nanotemplates for High Pressure CVD

2006 ◽  
Vol 988 ◽  
Author(s):  
Neil Baril ◽  
John Badding ◽  
Pier Savio ◽  
Venkatraman Gopalan ◽  
Dong-Jin Won ◽  
...  

AbstractSolid state chemists have long been interested in templated growth of materials using many approaches. The resulting materials have been useful in areas as diverse as photonics and catalysis. Microstructured optical fibers (MOFs) form a new class of nanotemplates that can have sub 20 nm pores that are meters to kilometers long. We have developed a high-pressure microfluidic chemical process that allows for conformal deposition of materials within MOFs to form the most extreme aspect ratio semiconductor nanowires known. The wires can be spatially organized with respect to each other at dimensions down to the nanoscale because the MOF templates can be designed with almost any desired periodic or aperiodic pattern. Many if not most of the chemistries used for conventional chemical vapor deposition (CVD) can be adapted for this process. The resulting materials should enable a large range of scientific and technological applications.

2006 ◽  
Vol 89 (11) ◽  
pp. 112119 ◽  
Author(s):  
M. Alevli ◽  
G. Durkaya ◽  
A. Weerasekara ◽  
A. G. U. Perera ◽  
N. Dietz ◽  
...  

APL Materials ◽  
2018 ◽  
Vol 6 (4) ◽  
pp. 046105 ◽  
Author(s):  
Xiaoyu Ji ◽  
Hiu Yan Cheng ◽  
Alex J. Grede ◽  
Alex Molina ◽  
Disha Talreja ◽  
...  

2000 ◽  
Vol 6 (S2) ◽  
pp. 456-457
Author(s):  
Yuli Lin ◽  
Li-Jang Hwang

Optical fibers have been extensively employed in a variety of fields. However, the need of high strength, excellent resistance to moisture permeation and tolerance to heat becomes apparent when such optical fibers are used in nuclear power plants and chemical plants in particular. Plastic coatings as conventional made of optical fibers cables would be replaced by the optical fiber coated with a layer of metal.Several techniques have been applied to make a metal coating for the optical fibers. Dipping method, to pass optical fibers through a bath containing metal melt, was found the simplest. This dipping method, however, suffers from a disadvantage of a generation of a microbent due to the differences of the linear expansion between metal and the silica substrate [1]. Moreover, the control of the thickness was found difficult using the dipping method. Chemical vapor deposition was also used to form the metal coating on optical fibers.


2010 ◽  
Vol 663-665 ◽  
pp. 1171-1174 ◽  
Author(s):  
Yan Qing Guo ◽  
Rui Huang ◽  
Jie Song ◽  
Xiang Wang ◽  
Yi Xiong Zhang

Nanocrystalline silicon films have been fabricated from SiH4 diluted with H2 in very high frequency (40.68 MHz) plasma enhanced chemical vapor deposition system at low temperatures (250oC). The influence of pressure on the structural properties of nanocrystalline silicon films has been investigated. The experimental results reveal that a very high hydrogen dilution is needed to crystallize the film grown at high pressure. If the hydrogen dilution is not high enough, the film could also be crystallized through lowering the pressure. Furthermore, the crystallinity and grain size increase with decreasing the pressure. These results could be attributed to the increase of ion bombardment energy and the higher atomic hydrogen flux toward the growing film surface at lower pressures.


2011 ◽  
Vol 1324 ◽  
Author(s):  
Kasif Teker ◽  
Joseph A. Oxenham

ABSTRACTThis paper presents a systematic investigation of AlN nanowire synthesis by chemical vapor deposition using Al and NH3 on SiO2/Si substrate and direct nitridation of mixture of Al-Al2O3 by NH3. A wide variety of catalyst materials, in both discrete nanoparticle and thin film forms, have been used (Co, Au, Ni, and Fe). The growth runs have been carried out at temperatures between 800 and 1100oC mainly under H2 as carrier gas. It was found that the most efficient catalyst in terms of nanowire formation yield was 20-nm Ni film. The AlN nanowire diameters are about 20-30 nm, about the same thickness as the Ni-film. Further studies of direct nitridation of mixture of Al-Al2O3 by NH3 have resulted in high density one-dimensional nanostructure networks at 1100oC. It was observed that catalyst-free nanostructures resulted from the direct nitridation were significantly longer than that with catalysts. The analysis of the grown nanowires has been carried out by scanning electron microscopy, transmission electron microscopy, atomic force microscopy, and x-ray diffraction.


2009 ◽  
Vol 29 (2) ◽  
pp. 317-324 ◽  
Author(s):  
Chang-Sheng Zha ◽  
Szczesny Krasnicki ◽  
Yu-Fei Meng ◽  
Chih-Shiue Yan ◽  
Joseph Lai ◽  
...  

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