CVD Processing
Keyword(s):
Gas Flow
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Various methods are used in functionally gradient materials technology to control the composition and structure of a composite.The chemical vapor deposition (CVD) method yields a deposit with source gases by applying variou s forms of energy (heat, light, plasma, etc.) to the gases after they are introduced into a CVD reactor. Hydride, bromide, and chloride are generally used for source materials. By continually changing the mixture ratio of source gases or by controlling the CVD conditions such as deposition temperatures, gas pressure, and gas-flow rate, CVD permits relatively easy syntheses of various FGMs (to a maximum thickness on the order of a centimeter).
1991 ◽
Vol 30
(Part 1, No. 4)
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pp. 633-634
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1992 ◽
Vol 31
(Part 1, No. 2A)
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pp. 225-226
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2015 ◽
Vol 1109
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pp. 456-460
2006 ◽
Vol 15
(2-3)
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pp. 371-377
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