scholarly journals Recent Results in the Crystal Growth of GaN at High N2 Pressure

Author(s):  
I. Grzegory ◽  
M. Bockowski ◽  
B. Lucznik ◽  
S. Krukowski ◽  
M. Wroblewski ◽  
...  

We present recent results on bulk GaN crystallization. The best quality GaN crystals grown from the solution at high N2 pressure without an intentional seeding are single crystalline platelets of stable morphology reaching dimensions up to 10 mm. The fastest growth direction for such crystals is [1 0 0], perpendicular to the GaN c-axis. The maximum stable growth rate perpendicular to crystal c-axis is determined from the experiment and used for an estimate of the effective supersaturation for the {10 0} face assuming two dimensional layer growth. The heat of GaN disssolution, determined from experimental solubility data, is used for the estimation of the edge energy of 2-D nuclei on the growing {10 0} face. Bulk crystal growth seeded by a single hexagonal needle with well developed {10 0} faces is also reported. The crystallization mechanisms and morphological stability in seeded growth of GaN are discussed on the basis of experimental results. The physical properties of the GaN crystals and homoepitaxial layers grown on them are briefly reviewed.

1986 ◽  
Vol 67 ◽  
Author(s):  
Yoshiro Ohmachi ◽  
Yukinobu Shinoda ◽  
Satoshi Oku

ABSTRACTAn approach to the composite layer growth of GaAs/Ge on Si(100) and insulator–coated Si(100) has been investigated. To overcome a problem of antiphase disorder of GaAs occurring along with epitaxial growth on Ge, thermal etching on Ge surfaces in hydrogen was introduced just prior to the growth. Antiphase–domain–free GaAs grown on a Ge(100) wafer exhibited mirror surfaces, photoluminescence characteristics comparable to those of homoepitaxial layers, and low etch–pit densities. The autodoping of Ge into GaAs induced a highly doped interfacial layer several thousand angstroms thick. The present study also involves heteroepitaxial growth of Ge on Si by vacuum deposition and Ge crystal growth on insulating layers over Si by LESS method.


1998 ◽  
Vol 510 ◽  
Author(s):  
Noboru Ohtani ◽  
Jun Takahashi ◽  
Masakazu Katsuno ◽  
Hirokatsu Yashiro ◽  
Masatoshi Kanaya

AbstractThe defect formation during sublimation bulk crystal growth of silicon carbide (SiC) is discussed. SiC bulk crystals are produced by seeded sublimation growth (modified-Lely method), where SiC source powder sublimes and is recrystallized on a slightly cooled seed crystal at uncommonly high temperatures (≥2000°C). The crystals contain structural defects such as micropipes (hollow core dislocations), subgrain boundaries, stacking faults and glide dislocations in the basal plane. The type and density of the defects largely depend on the crystal growth direction, and many aspects are different between the growth parallel and perpendicular to the <0001> c-axis. Micropipes are characteristic defects to the c-axis growth, while a large number of stacking faults are introduced during growth perpendicular to the c-axis. We discuss the cause and mechanism of the defect formation


2004 ◽  
Vol 14 (01) ◽  
pp. 51-62 ◽  
Author(s):  
P. R. TAVERNIER ◽  
E. V. ETZKORN ◽  
D. R. CLARKE

The essential steps required to create thick GaN films and seed crystals for bulk crystal growth are described. These include the growth of low dislocation density GaN films by hydride vapor phase epitaxy and the separation of films from their growth substrates. Also addressed are issues of processing thin and thick films to create compliant layer substrates for thick film HVPE growth and chemical mechanical polishing methods to enhance surface morphology and remove material damage free. Growth of both gallium and nitrogen polar films is discussed with key issues identified regarding polarity inversion during growth and impurity incorporation along the -c growth direction. These are illustrated with examples that emphasize the growth of material with low threading dislocation density.


Author(s):  
Joanna L. Batstone

Interest in II-VI semiconductors centres around optoelectronic device applications. The wide band gap II-VI semiconductors such as ZnS, ZnSe and ZnTe have been used in lasers and electroluminescent displays yielding room temperature blue luminescence. The narrow gap II-VI semiconductors such as CdTe and HgxCd1-x Te are currently used for infrared detectors, where the band gap can be varied continuously by changing the alloy composition x.Two major sources of precipitation can be identified in II-VI materials; (i) dopant introduction leading to local variations in concentration and subsequent precipitation and (ii) Te precipitation in ZnTe, CdTe and HgCdTe due to native point defects which arise from problems associated with stoichiometry control during crystal growth. Precipitation is observed in both bulk crystal growth and epitaxial growth and is frequently associated with segregation and precipitation at dislocations and grain boundaries. Precipitation has been observed using transmission electron microscopy (TEM) which is sensitive to local strain fields around inclusions.


2012 ◽  
Vol 27 (19) ◽  
pp. 2503-2510 ◽  
Author(s):  
Shashi Bairagi Atla ◽  
Chien-Yen Chen ◽  
Chien-Cheng Chen ◽  
Shao-Ju Shih ◽  
Pin-Yun Lin ◽  
...  

Abstract


2000 ◽  
Author(s):  
Jeffrey J. Derby ◽  
Andrew Yeckel

Abstract Modern finite element methods implemented on parallel supercomputers promise to allow the study of three-dimensional, time-dependent continuum phenomena in many engineering systems. This paper shows several examples of the fruitful application of these approaches to bulk crystal growth systems, where strongly nonlinear coupled phenomena are important.


2004 ◽  
Vol 268 (1-2) ◽  
pp. 328 ◽  
Author(s):  
I.D Matukov ◽  
D.S Kalinin ◽  
M.V Bogdanov ◽  
S.Yu Karpov ◽  
D.Kh Ofengeim ◽  
...  

2010 ◽  
Author(s):  
Jeffrey J. Derby ◽  
W. Wang ◽  
Katsuo Tsukamoto ◽  
Di Wu

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