Dispersion, High-Frequency and Power Characteristics of AlN/GaN Metal Insulator Semiconductor Field Effect Transistors with in-situ MOCVD Deposited Si3N4
2010 ◽
Vol E93-C
(8)
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pp. 1245-1250
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1991 ◽
Vol 30
(Part 1, No. 6)
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pp. 1190-1193
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2017 ◽
pp. 217-232
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Keyword(s):
2019 ◽
Vol 7
(29)
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pp. 8855-8860
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Keyword(s):
Keyword(s):