GAS DISTRIBUTION SYSTEM FOR OPTIMIZATION OF THE TECHNOLOGICAL PROCESS OF COATING IN AN UNBALANCED MAGNETRON SPUTTERING INSTALLATION
2021 ◽
Vol 3
◽
pp. 368-371
Keyword(s):
The paper proposes a new design solution for regulating the distribution of the working gases in the vacuum chamber of the installation (UDP -850/4) for unbalanced magnetron sputtering, which will improve the mode and quality of application of multilayer nano-coatings. Constructive documentation for manufacturing a gas distribution system has been prepared, as well as instructions for assembly to the vacuum chamber.
2012 ◽
Vol 49
(6)
◽
pp. 620-624
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2014 ◽
Vol 52
(12)
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pp. 969-974
1992 ◽
Vol 102-104
◽
pp. 563-572
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1999 ◽
Vol 113
(1-2)
◽
pp. 75-79
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Keyword(s):
2000 ◽
Vol 130
(1)
◽
pp. 64-68
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Keyword(s):
1990 ◽
Vol 43-44
◽
pp. 270-278
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2019 ◽
Vol 359
◽
pp. 334-341
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2017 ◽
Vol 830
◽
pp. 012057
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