SECONDARY PROCESSING OF CAST TUBE CATHODES WHEN OBTAINING A METAL POWDER COMPOSITION FOR THE GAS-THERMAL SPRAY OF COATINGS

The paper presents the results of structural studies of metal-powder compositions (MPC) from the VSDP-3 alloy, as well as heat-resistant atmospheric-plasma powder coatings, developed at the FSUE «VIAM». As blanks for sputtering the MPC, standard charge blanks and exhausted resource cast tube cathodes for ion-plasma deposition were used. It was found that MPC obtained by sputtering cathodes and coatings deposited by sputtering these MPC are not inferior in properties to standard MPC and coatings. At the same time, the cost of such MPC and coatings can be 20–40% lower.

Download Full-text

Effect of Metal-Powder Composition Fraction and Layer Thickness on Structure and Mechanical Properties of Alloy VT6 Synthesized Material Prepared by Selective Laser Melting

Metallurgist ◽

10.1007/s11015-021-01213-x ◽

2021 ◽

Author(s):

D. I. Sukhov ◽

N. A. Khodirev ◽

A. M. Rogalev ◽

S. E. Kurkin ◽

S. V Nerush

Keyword(s):

Mechanical Properties ◽

Layer Thickness ◽

Metal Powder ◽

Selective Laser Melting ◽

Laser Melting ◽

Powder Composition

Download Full-text

LOW-TEMPERATURE ION-PLASMA DEPOSITION TECHNOLOGY OF NANOSTRUCTURED FILMS OF ALUMINUM AND BORON NITRIDES

Optoelektronìka ta napìvprovìdnikova tehnìka ◽

10.15407/iopt.2021.56.097 ◽

2021 ◽

Vol 56 ◽

pp. 97-107

Author(s):

M. S. Zayats ◽

Keyword(s):

Dielectric Properties ◽

Low Temperature ◽

Magnetron Sputtering ◽

High Frequency ◽

Plasma Deposition ◽

Heating Temperature ◽

Substrate Heating ◽

Ion Plasma ◽

Technological Cycle ◽

Physical And Chemical

A low-temperature (substrate heating temperature up to 400 °C) ion-plasma technology for the formation of nanostructured AlN and BN films by the method of high-frequency reactive magnetron sputtering of the corresponding targets has been developed (the modernized installation "Cathode-1M"), which has in its technological cycle the means of physical and chemical modification, which allow to purposefully control the phase composition, surface morphology, size and texture of nanocrystalline films. The possibility of using the method of high-frequency magnetron sputtering for deposition of transparent hexagonal BN films in the nanoscale state on quartz and silicon substrates is shown. Atomic force microscopy (AFM) has shown that AlN films can have an amorphous or polycrystalline surface with grain sizes of approximately 20-100 nm, with the height of the nanoparticles varying from 3 to 10 nm and the degree of surface roughness from 1 to 10 nm. It was found that the dielectric penetration of polycrystalline AlN films decreases from 10 to 3.5 at increased frequencies from 25 Hz to 1 MHz, and the peak tangent of the dielectric loss angle reaches 0.2 at 10 kHz. Such features indicate the existence of spontaneous polarization of dipoles in the obtained AlN films. Interest in dielectric properties in AlN / Si structures it is also due to the fact that there are point defects, such as nitrogen vacancies and silicon atoms, which diffuse from the silicon substrate during synthesis and play an important role in the dielectric properties of AlN during the formation of dipoles. The technology makes it possible, in a single technological cycle, to produce multilayer structures modified for specific functional tasks with specified characteristics necessary for the manufacture of modern electronics, optoelectronics and sensorics devices. It should also be noted that the technology of magnetron sputtering (installation "Cathode-1M") is highly productive, energetically efficient and environmentally friendly in comparison with other known technologies for creating semiconductor structures and allows them to be obtained with minimal changes in the technological cycle.

Download Full-text

Interaction of diamond with molybdenum during ion plasma deposition

Diamond and Related Materials ◽

10.1016/0925-9635(94)90032-9 ◽

1994 ◽

Vol 3 (1-2) ◽

pp. 61-65 ◽

Cited By ~ 4

Author(s):

N.V. Novikov ◽

M.A. Voronkin ◽

I.V. Bondar

Keyword(s):

Plasma Deposition ◽

Ion Plasma

Download Full-text

Coatings of Carbide-Metal Systems (Cr3C2-NiCr and WC-Co-Cr) Deposited by High-Velocity Atmospheric Plasma Spraying from Specially Modified Fine-Grained Powders

Journal of Thermal Spray and Engineering ◽

10.52687/2582-1474/114 ◽

2018 ◽

Vol 1 (1) ◽

pp. 18-23

Author(s):

Vadim Verlotski ◽

Keyword(s):

Plasma Spraying ◽

High Speed ◽

Plasma Deposition ◽

Thermal Spraying ◽

Atmospheric Plasma ◽

Metal Particles ◽

Fine Grained ◽

Plasma Torches ◽

Carbide Coatings ◽

Gas Tight

In this article, the author poses and responds to a provocative question that has practically ceased to be asked in the field of thermal spraying of carbide coatings: Is the current worldwide trend of using only unmelted metal particles to form coatings (HVOF, HVAF and cold spray methods) correct, and is the deposition of completely melted powders (plasma spraying methods) really outdated? The results of high-speed plasma deposition of new carbide powders allowed the author to prove that only coatings from molten particles can solve the main problem of such coatings, namely the problem of permeability along the grain boundaries. Through the use of modern Axial III plasma torches combined with optimized fine-grained powders, it has been possible to create Cr3C2-NiCr as well as WC-Co-Cr gas-tight layers.

Download Full-text