Theoretical Analysis of On-chip Vertical Hybrid Plasmonic Nanograting
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On Chip
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Abstract a CMOS compatible photonic-plasmonic waveguide with nanoscale optical confinement has been proposed for the infrared (IR)-band applications. The design is based on the multilayer hybrid plasmonic waveguide (Si-SiO2-Au) structure. The 3D-finite element method (FEM) numerical simulation of single slot HPWG confirms 2.5 dB/cm propagation loss and 15 um− 2 confined intensity. Moreover, its application as dual-slot nanograting is studied which shows better propagation length and ultra-low dispersion near the 1550 nm wavelength. Hence, proposed low-dispersion design is suitable for future on-chip nanophotonic components in the IR band.
2017 ◽
Vol 898
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pp. 1325-1331
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2011 ◽
Vol 23
(4)
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pp. 206-208
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2013 ◽
Vol 668
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pp. 534-537
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1994 ◽
Vol 30
(5)
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pp. 3224-3227
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2009 ◽
Vol 22
(5)
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pp. 055005
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2010 ◽
Vol 130
(9)
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pp. 1102-1107
2005 ◽
Vol 125
(2)
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pp. 185-191
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