scholarly journals Синтез тонких пленок TiN, Ti и TiSi-=SUB=-2-=/SUB=- для контактной системы солнечных элементов

2020 ◽  
Vol 62 (1) ◽  
pp. 46
Author(s):  
К.Х. Нусупов ◽  
Н.Б. Бейсенханов ◽  
Д.И. Бакранова ◽  
С. Кейнбай ◽  
А.А. Турахун ◽  
...  
Keyword(s):  
Flow Rate ◽  
Gas Flow ◽  
High Hardness ◽  
Gas Flows ◽  
Gas Flow Rate ◽  
X Ray Diffraction ◽  
Deposition Parameters ◽  
C 30 ◽  
Ar Gas ◽  
Deposited Films

Abstract The influence of deposition parameters, such as: the magnetron power in the range 690–1400 W, the silicon substrate temperature 23–170°C, the N_2 gas flow rate 0.9–3.6 L/h, the Ar gas flow rate 0.06‒3.6 L/h, the ratio of N_2/Ar gas flows 1–60 on the thickness, the density, and the composition of the deposited films is analyzed. The maximum density 5.247 g/cm^3 corresponding to the TiN_0.786 = Ti_56N_44 composition has been achieved at the following deposition parameters: 1200 W, N/Ar = 1.8/0.06 L/h = 30, 0.8 Pa, 320 s, and 100°C. At temperatures 700–800°C, the mutual diffusion of titanium and silicon atoms through the interface leads to the active nucleation, the formation of nanocrystals and low-resistance metallization layers. X-ray diffraction shows that, during annealing at 700°C (30 min, Ar), the formation of phase TiSi_2 due to the diffusion of Ti atoms into silicon is twice more intense than the formation of Ti_5Si_3 due to the diffusion of silicon atoms into titanium as a result of high hardness of titanium. The average sizes of TiSi_2 decreases from 7.1 to 5.6 nm at 750°C due to the crystallization of the nuclei and increase to 9.2 nm at 800°C.

INFLUENCE OF NITROGEN FLOW RATE IN REDUCING TIN MICRODROPLETS ON BIOMEDICAL TI-13ZR-13NB ALLOY

2016 ◽  
Vol 78 (5-10) ◽  
Author(s):  
Arman Shah ◽  
S. Izman ◽  
M. A. Hassan
Keyword(s):  
Flow Rate ◽  
Physical Vapor Deposition ◽  
Gas Flow ◽  
Detrimental Effect ◽  
Gas Flow Rate ◽  
X Ray Diffraction ◽  
Tin Coating ◽  
Nitrogen Gas ◽  
Deposition Parameters ◽  
Cathodic Arc

Cathodic arc physical vapor deposition (CAPVD) is one of the promising techniques that have a potential to coat titanium nitride (TiN) on biomedical implants due to its good adhesion and high evaporation rate. However, this method emits microdroplets which have the possible detrimental effect on the coating performance. Past studies indicated that micro droplets can be controlled through proper deposition parameters. In the present work, an attempt was made to study the effect of nitrogen gas flow rates (100 to 300 sccm) on TiN coating of the Ti-13Zr-13Nb biomedical alloy. Scanning electron microscopy (SEM) was used to evaluate surface morphology and coating thickness while crystal phase of the coated substrates was determined using X-Ray Diffraction (XRD). Image analysis software was employed to quantify microdroplets counts. Results show that higher nitrogen gas flow rate able to decrease a significant amount of microdroplets and concurrently increase the thickness of TiN coating. A mixed crystal planes of (111) and (220) are obtained on the coated substrates at this setting which exhibits denser structure with higher adhesion strength as compared to substrates coated at the lower N2 gas flow rate.

A Study on the Effect of Process Parameters on Surface Topography of Al Thin Films on Various Substrates Using AFM

2011 ◽  
Vol 383-390 ◽  
pp. 903-908
Author(s):  
S. Shanmugan ◽  
D. Mutharasu ◽  
Z. Hassan ◽  
H. Abu. Hassan
Keyword(s):  
Thin Films ◽  
Surface Topography ◽  
Flow Rate ◽  
Gas Flow ◽  
Process Conditions ◽  
Gas Flow Rate ◽  
Glass Substrates ◽  
Sputtering Power ◽  
Large Particles ◽  
Ar Gas

Al thin films were prepared over different substrates at various process conditions using DC sputtering. The surface topography of all prepared films was examined using AFM technique. Very smooth, uniform and dense surface were observed for Al films coated over Glass substrates. The observed particle size was nano scale (20 -70 nm) for Glass substrates. Sputtering power showed immense effect on surface roughness with respective to Ar gas flow rate. Noticeable change on surface with large particles was observed in Copper substrates at various sputtering power and gas flow rate.

scholarly journals Carbon Co-Deposition During Gas Reduction of Water-Atomized Fe-Cr-Mo Powder

2017 ◽  
Vol 62 (2) ◽  
pp. 1119-1124
Author(s):  
B. Ali ◽  
S.H. Choi ◽  
S.J. Seo ◽  
D.Y. Maeng ◽  
C.G. Lee ◽  
...  
Keyword(s):  
Carbon Content ◽  
Oxide Layer ◽  
Iron Powder ◽  
Flow Rate ◽  
Gas Flow ◽  
Gas Flow Rate ◽  
High Quality ◽  
Exponential Relationship ◽  
Water Atomization ◽  
Ar Gas

AbstractThe water atomization of iron powder with a composition of Fe-3Cr-0.5Mo (wt.%) at 1600°C and 150 bar creates an oxide layer, which in this study was reduced using a mixture of methane (CH4) and argon (Ar) gas. The lowest oxygen content was achieved with a 100 cc/min flow rate of CH4, but this also resulted in a co-deposition of carbon due to the cracking of CH4. This carbon can be used directly to create high-quality, sinter hardenable steel, thereby eliminating the need for an additional mixing step prior to sintering. An exponential relationship was found to exist between the CH4gas flow rate and carbon content of the powder, meaning that its composition can be easily controlled to suit a variety of different applications.

scholarly journals ZnO:Al Thin Films with Buffer Layers Fabricated via Nitrogen Mediated Crystallization: Effects of N2/Ar Gas Flow Rate Ratio

2012 ◽  
Vol 37 (2) ◽  
pp. 165-168 ◽  
Author(s):  
Iping Suhariadi ◽  
Naho Itagaki ◽  
Kazunari Kuwahara ◽  
Koichi Oshikawa ◽  
Daisuke Yamashita ◽  
...  
Keyword(s):  
Thin Films ◽  
Flow Rate ◽  
Rate Ratio ◽  
Gas Flow ◽  
Buffer Layers ◽  
Flow Rate Ratio ◽  
Gas Flow Rate ◽  
Ar Gas

Growth Promotion and Etching of Carbon Nanotubes by Carbon Dioxide in Chemical Vapor Deposition using Methane Gas

2007 ◽  
Vol 1057 ◽  
Author(s):  
Yoshiyuki Suda ◽  
Junichi Takayama ◽  
Takeshi Saito ◽  
Atsushi Okita ◽  
Junji Nakamura ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Flow Rate ◽  
Vapor Deposition ◽  
Gas Flow ◽  
Growth Promotion ◽  
Chemical Vapor ◽  
Gas Flow Rate ◽  
Preferential Growth ◽  
Ar Gas ◽  
Walled Cnts

ABSTRACTWe report the effect of CO2 addition to CO4 gas on carbon nanotube (CNT) growth by chemical vapor deposition. CO2 gas was introduced during the growth of CNTs on Fe0.05Mo0.025MgO0.925 and Ni0.05Mo0.025MgO0.925 catalysts by CO4 gas at a temperature of 800–850°C, and its concentration in a fraction of the gas flow rate was varied from 5×10−3 to 50%. In the experimental condition of the preferential growth of multi-walled CNTs, the carbon yield and the G/D ratio in the Raman spectra of the CNTs grown in 10%-CO2/CO4 were slightly higher than that grown in CO4 only. However, CNTs hardly grew when the CO2 concentration was more than 10%. We then prepared CO2 gas diluted with Ar gas (CO2/Ar) and varied its flow rate between 0 and 10 sccm. As the CO2/Ar gas flow rate was increased, the number of RBM peaks decreased even though the G/D ratio gradually decreased. The decrease in the RBM intensities of CNTs on the FeMoMgO catalyst was more significant than that of NiMoMgO.

Preparation and Mechanical Characterization of Amorphous B-C Films

2014 ◽  
Vol 970 ◽  
pp. 124-127 ◽  
Author(s):  
Shahira Liza ◽  
Hiroki Akasaka ◽  
Masayuki Nakano ◽  
Naoto Ohtake
Keyword(s):  
Mechanical Properties ◽  
Flow Rate ◽  
Gas Flow ◽  
Boron Content ◽  
Film Surface ◽  
Chemical Vapor ◽  
High Hardness ◽  
Atomic Ratio ◽  
Gas Flow Rate ◽  
Gas Pressures

This study has demonstrated that trimethylboron, B(CH3)3 is a suitable boron source material for the fabrication amorphous boron carbide (a-BC:H) films. a-BC:H films were deposited by pluse plasma chemical vapor deposition on a silicon substrate (100) with different gas pressures and gas flow rates at constant voltage, -5 kV . The grown a-BC:H films were found to be porous surface and their thickness were in the range of 0.95 to 1.56 μm for 3 h of deposition time. Results indicated that the boron contents, morphologies and mechanical properties of the a-BC:H films were dependent on the gas pressures and gas flow rate. The increased of boron content will introduce more porous film surface. The effect of boron content on the mechanical properties such as hardness, Youngs modulus, and wear resistance were discussed. The good quality film is obtained from B(CH3)3 at 5 Pa and gas flow rate of 15 cm3/min which boron to carbon atomic ratio is 0.43. This film has lower friction coefficient (0.3) sliding against stainless steel ball, high hardness (8.1 GPa) and Youngs modulus (62.2 GPa).

Influence of Ar gas flow rate in organosilicon plasma for the fabrication of SiO:CH thin films by PECVD method

2008 ◽  
Vol 202 (22-23) ◽  
pp. 5259-5261 ◽  
Author(s):  
Yongsup Yun ◽  
Takanori Yoshida ◽  
Norifumi Shimazu ◽  
Naoki Nanba ◽  
Yasushi Inoue ◽  
...  
Keyword(s):  
Thin Films ◽  
Flow Rate ◽  
Gas Flow ◽  
Gas Flow Rate ◽  
Ar Gas

scholarly journals Preliminary torrefaction of oil palm empty fruit bunch pellets

2019 ◽  
Vol 90 ◽  
pp. 01014
Author(s):  
Bemgba B. Nyakuma ◽  
Arshad Ahmad ◽  
Anwar Johari ◽  
Tuan Amran T. Abdullah ◽  
Olagoke Oladokun ◽  
...  
Keyword(s):  
Flow Rate ◽  
Oil Palm ◽  
Gas Flow ◽  
Energy Yield ◽  
Gas Flow Rate ◽  
Empty Fruit Bunches ◽  
Recovery Potential ◽  
Solid Biofuel ◽  
C 30 ◽  
Purge Gas

Torrefaction of pelletised oil palm empty fruit bunches (OPEFBs) is a promising pretreatment technique for improving its solid biofuel properties and energy recovery potential. Therefore, this paper investigates the torrefaction of OPEFB pellets to examine the effects of temperature and purge gas flow rate on mass yield (MY), energy yield (EY), and mass loss (ML). The results revealed that MY and EY decreased due to significant ML during torrefaction. Furthermore, significant improvements in the higher heating value (HHV) and energy density (DE) were observed. The torrefaction temperature increased liquid (tar) and gas yields mainly above 300 °C at the expense of solid products. However, the effect of purge gas flow rate on the torrefaction products was found to be negligible. Consequently, the torrefaction of OPEFB pellets were limited to 250-300 °C, 30 min, and nitrogen (N2) gas flow rate of 200 ml min-1.

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